9781041192237 - Plasma Electronics: Applications in Microelectronic Device Fabrication de Makabe, Toshiaki; Petrovi?, Zoran Lj. (16 resultados)

Condición: New.

Condición: New.

Condición: New.

Condición: As New. Unread book in perfect condition.

Condición: New.

Condición: New.

Condición: As New. Unread book in perfect condition.

Hardback. Condición: New. New copy - Usually dispatched within 4 working days.

Condición: New. Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of Science and Technology at Keio University in 1991.

Condición: New.

Condición: New. Brand New! Fast Delivery This is an International Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.

Hardcover. Condición: Brand New. 3rd edition. 435 pages. 9.18x6.12x9.45 inches. In Stock.

Buch. Condición: Neu. Neuware - More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications.Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma.This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape.Key Features: Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory Provides systematic coverage of surface-reactive plasma physics Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields.

Hardcover. Condición: new. Hardcover. More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications.Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma.This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape.Key Features: Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory Provides systematic coverage of surface-reactive plasma physics Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This item is printed on demand. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.

Hardcover. Condición: new. Hardcover. More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications.Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma.This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape.Key Features: Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory Provides systematic coverage of surface-reactive plasma physics Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.

Hardcover. Condición: new. Hardcover. More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications.Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma.This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape.Key Features: Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory Provides systematic coverage of surface-reactive plasma physics Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This item is printed on demand. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.