9783659973482 - characteristics and thermal behavior of sputtered titanium thin films on various substrates de porter, prof. glen andrew; chang, prof. rwei ching; chao, prof. ching kong (10 resultados)
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Porter, Prof. Glen Andrew; Chang, Prof. Rwei Ching; Chao, Prof. Ching Kong
- Tapa blanda
Librería: Books Puddle, New York, NY, Estados Unidos de AmericaBooks Puddle
Contactar con el vendedorVendedor de 4 estrellasCondición: Nuevo
EUR 111,02
Envío por EUR 3,45Se envía dentro de Estados Unidos de AmericaCantidad disponible: 4 disponibles
Condición: New.
- Tapa blanda
Librería: preigu, Osnabrück, Alemaniapreigu
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 61,05
Envío por EUR 70,00Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: 5 disponibles
Taschenbuch. Condición: Neu. Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates | Glen Andrew Porter (u. a.) | Taschenbuch | 200 S. | Englisch | 2019 | LAP LAMBERT Academic Publishing | EAN 9783659973482 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 4…9078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Porter, Prof. Glen Andrew/ Chang, Prof. Rwei Ching/ Chao, Prof. Ching Kong
- Tapa blanda
Librería: Revaluation Books, Exeter, Reino UnidoRevaluation Books
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 142,35
Envío por EUR 11,67Se envía de Reino Unido a Estados Unidos de AmericaCantidad disponible: 1 disponibles
Paperback. Condición: Brand New. 200 pages. 8.66x5.91x0.46 inches. In Stock.
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Porter, Prof. Glen Andrew, Chang, Prof. Rwei Ching, Chao, Pr
- Tapa blanda
Librería: Mispah books, Redhill, SURRE, Reino UnidoMispah books
Contactar con el vendedorVendedor de 4 estrellasCondición: Nuevo
EUR 200,75
Envío por EUR 29,18Se envía de Reino Unido a Estados Unidos de AmericaCantidad disponible: 1 disponibles
paperback. Condición: New. NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
- Tapa blanda
- Impresión bajo demanda
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 71,90
Envío por EUR 23,00Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: 2 disponibles
Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Titanium films are growing in popularity, and are soon expected to replace copper for metallization purposes. However, the thermal stress behavior of titanium films had not been extensively studied, and therefore not clearly underst…ood. Thus, the main goal of this work was to develop a systematic process to analyze and model the ds/dT evolution between 20ºC and 300ºC, in sputtered, titanium thin films. A biaxial stress state has been legitimately assumed. In the laboratory, titanium films, with a nominal thickness of 200 nm, were deposited on five different kinds of unheated substrates, by RF magnetron sputtering. These substrates included titanium plate, soda-lime glass and three kinds of p-type silicon wafers, having crystallographic orientations of (100), (110) and (111). X-ray diffraction was used to characterize the crystallographic evolution with respect to temperature. By utilizing a heating chamber and special tooling, the lattice spacings were measured in-situ, and the thermal stress behaviors were estimated with either the sin2 method or the d-spacing method. 200 pp. Englisch.
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Prof. Glen Andrew Porter|Prof. Rwei Ching Chang|Prof. Ching Kong Chao
- Tapa blanda
- Impresión bajo demanda
Librería: moluna, Greven, Alemaniamoluna
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 58,12
Envío por EUR 48,99Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: Más de 20 disponibles
Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Porter Prof. Glen AndrewDr. Glen Andrew Porter is currently an Assistant Professor in the Electronic Engineering Department at the National Kaohsiung University of Science and Technology.Titanium films…are growing in popularity, .
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Porter, Prof. Glen Andrew; Chang, Prof. Rwei Ching; Chao, Prof. Ching Kong
- Tapa blanda
- Impresión bajo demanda
Librería: Majestic Books, Hounslow, Reino UnidoMajestic Books
Contactar con el vendedorVendedor de 4 estrellasCondición: Nuevo
EUR 113,43
Envío por EUR 7,59Se envía de Reino Unido a Estados Unidos de AmericaCantidad disponible: 4 disponibles
Condición: New. Print on Demand.
Characteristics and Thermal Behavior of Sputtered Titanium Thin Films on Various Substrates
Porter, Prof. Glen Andrew; Chang, Prof. Rwei Ching; Chao, Prof. Ching Kong
- Tapa blanda
- Impresión bajo demanda
Librería: Biblios, frankfurt am main, HESSE, AlemaniaBiblios
Contactar con el vendedorVendedor de 4 estrellasCondición: Nuevo
EUR 116,32
Envío por EUR 9,95Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: 4 disponibles
Condición: New. PRINT ON DEMAND.
- Tapa blanda
- Impresión bajo demanda
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 71,90
Envío por EUR 60,00Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: 1 disponibles
Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Titanium films are growing in popularity, and are soon expected to replace copper for metallization purposes. However, the thermal stress behavior of titanium films had not been extensively studied, and therefore not clearly understood.… Thus, the main goal of this work was to develop a systematic process to analyze and model the d¿/dT evolution between 20ºC and 300ºC, in sputtered, titanium thin films. A biaxial stress state has been legitimately assumed. In the laboratory, titanium films, with a nominal thickness of 200 nm, were deposited on five different kinds of unheated substrates, by RF magnetron sputtering. These substrates included titanium plate, soda-lime glass and three kinds of p-type silicon wafers, having crystallographic orientations of (100), (110) and (111). X-ray diffraction was used to characterize the crystallographic evolution with respect to temperature. By utilizing a heating chamber and special tooling, the lattice spacings were measured in-situ, and the thermal stress behaviors were estimated with either the sin2¿ method or the d-spacing method.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 200 pp. Englisch.
- Tapa blanda
- Impresión bajo demanda
Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 72,76
Envío por EUR 61,58Se envía de Alemania a Estados Unidos de AmericaCantidad disponible: 1 disponibles
Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Titanium films are growing in popularity, and are soon expected to replace copper for metallization purposes. However, the thermal stress behavior of titanium films had not been extensively studied, and therefore not clearly understood.…Thus, the main goal of this work was to develop a systematic process to analyze and model the ds/dT evolution between 20ºC and 300ºC, in sputtered, titanium thin films. A biaxial stress state has been legitimately assumed. In the laboratory, titanium films, with a nominal thickness of 200 nm, were deposited on five different kinds of unheated substrates, by RF magnetron sputtering. These substrates included titanium plate, soda-lime glass and three kinds of p-type silicon wafers, having crystallographic orientations of (100), (110) and (111). X-ray diffraction was used to characterize the crystallographic evolution with respect to temperature. By utilizing a heating chamber and special tooling, the lattice spacings were measured in-situ, and the thermal stress behaviors were estimated with either the sin2 method or the d-spacing method.
