Loo sjir (11 resultados)

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: GreatBookPrices, Columbia, MD, Estados Unidos de AmericaGreatBookPrices
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EUR 64,00
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Condición: As New. Unread book in perfect condition.

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: GreatBookPrices, Columbia, MD, Estados Unidos de AmericaGreatBookPrices
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EUR 77,93
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Condición: New.

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: Books Puddle, Woodside, NY, Estados Unidos de AmericaBooks Puddle
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EUR 83,34
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Condición: New. pp. 126.

Idioma: Inglés
Editorial: Springer Verlag, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: Revaluation Books, Exeter, Reino UnidoRevaluation Books
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EUR 79,09
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Paperback. Condición: Brand New. 2012 edition. 90 pages. 9.25x6.25x0.25 inches. In Stock.

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH
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EUR 66,40
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Taschenbuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - Architectural stress is the inability of a system design to respond to new market demands. It is an important yet often concealed issue in high tech systems. In From scientific instrument to industrial machine, we look at the phenomenon of architectural stress in embedded systems in the context of a transmission electron microscope system built by FEI Company. Traditionally, transmission electron microscopes are manually operated scientific instruments, but they also have enormous potential for use in industrial applications. However, this new market has quite different characteristics. There are strong demands for cost-effective analysis, accurate and precise measurements, and ease-of-use. These demands can be translated into new system qualities, e.g. reliability, predictability and high throughput, as well as new functions, e.g. automation of electron microscopic analyses, automated focusing and positioning functions.From scientific instrument to industrial machine takes a pragmatic approach to the problem of architectural stress. In particular, it describes the outcomes of the Condor project, a joint endeavour by a consortium of industrial and academic partners. In this collaboration an integrated approach was essential to successfully combine various scientific results and show the first steps towards a new direction. System modelling and prototyping were the key techniques to develop better understanding and innovative solutions to the problems associated with architectural stress.From scientific instruments to industrial machine is targeted mainly at industrial practitioners, in particular system architects and engineers working on high tech systems. It can therefore be read without particular knowledge of electron microscope systems or microscopic applications. The book forms a bridge between academic and applied science, and high tech industrial practice. By showing the approaches and solutions developed for the electron microscope, it is hoped that system designers will gain some insights in how to deal with architectural stress in similar challenges in the high tech industry.…

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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- Impresión bajo demanda
Librería: Brook Bookstore On Demand, Napoli, NA, ItaliaBrook Bookstore On Demand
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EUR 46,22
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Condición: new. Questo è un articolo print on demand.

Idioma: Inglés
Editorial: Springer Netherlands Apr 2012, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.
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EUR 53,49
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Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Architectural stress is the inability of a system design to respond to new market demands. It is an important yet often concealed issue in high tech systems. In From scientific instrument to industrial machine, we look at the phenomenon of architectural stress in embedded systems in the context of a transmission electron microscope system built by FEI Company. Traditionally, transmission electron microscopes are manually operated scientific instruments, but they also have enormous potential for use in industrial applications. However, this new market has quite different characteristics. There are strong demands for cost-effective analysis, accurate and precise measurements, and ease-of-use. These demands can be translated into new system qualities, e.g. reliability, predictability and high throughput, as well as new functions, e.g. automation of electron microscopic analyses, automated focusing and positioning functions.From scientific instrument to industrial machine takes a pragmatic approach to the problem of architectural stress. In particular, it describes the outcomes of the Condor project, a joint endeavour by a consortium of industrial and academic partners. In this collaboration an integrated approach was essential to successfully combine various scientific results and show the first steps towards a new direction. System modelling and prototyping were the key techniques to develop better understanding and innovative solutions to the problems associated with architectural stress.From scientific instruments to industrial machine is targeted mainly at industrial practitioners, in particular system architects and engineers working on high tech systems. It can therefore be read without particular knowledge of electron microscope systems or microscopic applications. The book forms a bridge between academic and applied science, and high tech industrial practice. By showing the approaches and solutions developed for the electron microscope, it is hoped that system designers will gain some insights in how to deal with architectural stress in similar challenges in the high tech industry. 124 pp. Englisch.…

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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- Impresión bajo demanda
Librería: Majestic Books, Hounslow, Reino UnidoMajestic Books
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EUR 83,65
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Condición: New. Print on Demand pp. 126 55 Illus.

Idioma: Inglés
Editorial: Springer, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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Librería: Biblios, frankfurt am main, HESSE, AlemaniaBiblios
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EUR 84,81
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Condición: New. PRINT ON DEMAND pp. 126.

Idioma: Inglés
Editorial: Springer Netherlands, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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- Impresión bajo demanda
Librería: moluna, Greven, Alemaniamoluna
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EUR 48,37
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Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Condensed knowledge, relatively easily applicable in other contextsExplains the type of problems without diving into detailsProvides examples of how to address analogous problems in different domainsUnderstandable solutions to recogn.…

Idioma: Inglés
Editorial: Springer, Springer Apr 2012, 2012
Serie: Libro 19 de 209 - SpringerBriefs in Electrical and Computer Engineering
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- Impresión bajo demanda
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000
Contactar con el vendedorVendedor de 5 estrellasCondición: Nuevo
EUR 53,49
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Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Architectural stress is the inability of a system design to respond to new market demands. It is an important yet often concealed issue in high tech systems. In From scientific instrument to industrial machine, we look at the phenomenon of architectural stress in embedded systems in the context of a transmission electron microscope system built by FEI Company. Traditionally, transmission electron microscopes are manually operated scientific instruments, but they also have enormous potential for use in industrial applications. However, this new market has quite different characteristics. There are strong demands for cost-effective analysis, accurate and precise measurements, and ease-of-use. These demands can be translated into new system qualities, e.g. reliability, predictability and high throughput, as well as new functions, e.g. automation of electron microscopic analyses, automated focusing and positioning functions.From scientific instrument to industrial machine takes a pragmatic approach to the problem of architectural stress. In particular, it describes the outcomes of the Condor project, a joint endeavour by a consortium of industrial and academic partners. In this collaboration an integrated approach was essential to successfully combine various scientific results and show the first steps towards a new direction. System modelling and prototyping were the key techniques to develop better understanding and innovative solutions to the problems associated with architectural stress.From scientific instruments to industrial machine is targeted mainly at industrial practitioners, in particular system architects and engineers working on high tech systems. It can therefore be read without particular knowledge of electron microscope systems or microscopic applications. The book forms a bridge between academic and applied science, and high tech industrial practice. By showing the approaches and solutions developed for the electron microscope, it is hoped that system designers will gain some insights in how to deal with architectural stress in similar challenges in the high tech industry.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 124 pp. Englisch.…