Dabrowski jarek (30 resultados)

gebundene Ausgabe. Condición: Gut. XVII, 490 S. : Ill., graph. Darst.; 24 cm, Cover with little wear, good condition. ISBN: 9783540204817 Sprache: Englisch Gewicht in Gramm: 1035.

hardcover. Condición: New. In shrink wrap. Looks like an interesting title.

Condición: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.

Condición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

HRD. Condición: New. New Book. Shipped from UK. Established seller since 2000.

Condición: gut. 2004. Predictive simulation of semiconductor processing: status and challenges. Springer series in materials science; 72. In deutscher Sprache. pages.

HRD. Condición: New. New Book. Shipped from UK. Established seller since 2000.

Condición: New.

Condición: New.

Condición: New. In English.

Condición: New. In English.

Condición: As New. Unread book in perfect condition.

Taschenbuch. Condición: Neu. Predictive Simulation of Semiconductor Processing | Status and Challenges | Eicke R. Weber (u. a.) | Taschenbuch | Springer Series in Materials Science | Englisch | 2010 | Springer Berlin Heidelberg | EAN 9783642058042 | Verantwortliche Person für die EU: Springer Heidelberg, Tiergartenstr. 17, 69121 Heidelberg, buchhandel-buch[at]springer[dot]com | Anbieter: preigu.…

Buch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - Predictive Simulation of Semiconductor Processingenables researchers and developersto extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.…

Hardcover. Condición: Brand New. 550 pages. 8.50x6.00x1.25 inches. In Stock.

Condición: New. pp. vii + 490 1st Edition.

Hardcover. Condición: Brand New. 1st edition. 490 pages. 9.25x6.25x0.75 inches. In Stock.

Paperback. Condición: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Gebunden. Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. InhaltsverzeichnisFundamental concepts and methods the famous Si(001) surface atomically flat and clean surfaces morphology of clean silicon surfaces chemical properties of silicon surfaces on the road to devices.Klappen.…

Gebunden. Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Detailed and up-to-date explanation of the key processes in semiconductor technology and their computational simulationJ. Dabrowski: Born in Warsaw, Poland, Sept. 29, 1958. PhD, Institute of Physics of the Polish Academy of Science (IF PAN), W. …

Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Detailed and up-to-date explanation of the key processes in semiconductor technology and their computational simulationJ. Dabrowski: Born in Warsaw, Poland, Sept. 29, 1958. PhD, Institute of Physics of the Polish Academy of Science (IF PAN), W.…

Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Predictive Simulation of Semiconductor Processingenables researchers and developersto extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. 516 pp. Englisch.…

Buch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Predictive Simulation of Semiconductor Processingenables researchers and developersto extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. 516 pp. Englisch.…

Buch. Condición: Neu. SILICON SURFACES & FORMATION OF. | Dabrowski Jarek | Buch | Gebunden | Englisch | 2000 | World Scientific | EAN 9789810232863 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.

Buch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references are numerous and organized in tables, allowing a search without the need to browse through the text.Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.…

Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Predictive Simulation of Semiconductor Processingenables researchers and developersto extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.…

Buch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 516 pp. Englisch.…

Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 516 pp. Englisch.…

Condición: New. Print on Demand pp. vii + 490 281 Illus.

Condición: New. PRINT ON DEMAND pp. vii + 490.