Isbn: 9783838369389 - flux profile modeling using monte carlo simulation: a simulation tool for deposition processess using molecular beam epitaxy (5 resultados)

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  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2010

    3838369386 / 9783838369389

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    Librería: preigu, Osnabrück, Alemaniapreigu

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    Taschenbuch. Condición: Neu. Flux Profile Modeling using Monte Carlo Simulation | A simulation tool for deposition processess using Molecular Beam Epitaxy | Ramprasad Vijayagopal (u. a.) | Taschenbuch | 104 S. | Englisch | 2010 | LAP LAMBERT Academic Publishing | EAN 9783838369389 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.…

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    Editorial: LAP LAMBERT Academic Publishing Jun 2010, 2010

    3838369386 / 9783838369389

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    Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.

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    Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers. 104 pp. Englisch.…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2010

    3838369386 / 9783838369389

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    Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH

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    Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2010

    3838369386 / 9783838369389

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    Librería: moluna, Greven, Alemaniamoluna

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    Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Vijayagopal RamprasadR. Vijayagopal received his masters degree in electrical engineering from the University of Nevada in 2004 and the University of Minnesota in 2006. His graduate thesis work at the University of Nevada has been.…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing Jun 2010, 2010

    3838369386 / 9783838369389

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    Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000

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    Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 104 pp. Englisch.…