Isbn: 9783659947483 - improving reliability of tungsten plug via on an integrated circuitry: process flow in bicmos and cmos technology with failure analysis,design of experiments,statistical analysis & wafer maps (8 resultados)

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  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2016

    3659947482 / 9783659947483

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    Librería: Books Puddle, Woodside, NY, Estados Unidos de AmericaBooks Puddle

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    Editorial: LAP LAMBERT Academic Publishing, 2016

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    Editorial: LAP LAMBERT Academic Publishing Sep 2016, 2016

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    Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.

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    Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The failure of an electronic circuitry with Aluminum metal process due to electromigration degradation has been a continuous process of research and development in semiconductor industry. With the advent of Internet of Things (IoT) revolution in global semiconductor industry, there is an expected huge demand for analog ICs for healthcare, automotive and other consumer electronic applications. Analog ICs make use of Aluminum metal process as most of the analog applications do not need a state-of-the-art technology. Aluminum is not only cost effective in use but also easy to use in processing as compared to copper. However, Aluminum metal process is prone to electromigration failures. Hence, Electronic chips that make use of Aluminum metal process have to undergo rigorous tests for reliability related failures. When wafer yield becomes low due to electromigration related failures, it results into a huge loss for the semiconductor foundries because of the capital intensive nature of this business. Hence, Semiconductor Industry Professional should be equipped with detail process steps in order to improve the process yield including statistical analysis with Design of Experiments (DoE). 168 pp. Englisch.…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2016

    3659947482 / 9783659947483

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    Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH

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    Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The failure of an electronic circuitry with Aluminum metal process due to electromigration degradation has been a continuous process of research and development in semiconductor industry. With the advent of Internet of Things (IoT) revolution in global semiconductor industry, there is an expected huge demand for analog ICs for healthcare, automotive and other consumer electronic applications. Analog ICs make use of Aluminum metal process as most of the analog applications do not need a state-of-the-art technology. Aluminum is not only cost effective in use but also easy to use in processing as compared to copper. However, Aluminum metal process is prone to electromigration failures. Hence, Electronic chips that make use of Aluminum metal process have to undergo rigorous tests for reliability related failures. When wafer yield becomes low due to electromigration related failures, it results into a huge loss for the semiconductor foundries because of the capital intensive nature of this business. Hence, Semiconductor Industry Professional should be equipped with detail process steps in order to improve the process yield including statistical analysis with Design of Experiments (DoE).…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2016

    3659947482 / 9783659947483

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    Librería: Majestic Books, Hounslow, Reino UnidoMajestic Books

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    EUR 103,63

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    Cantidad disponible: 4 disponibles

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  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2016

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    Librería: Biblios, frankfurt am main, HESSE, AlemaniaBiblios

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  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing, 2016

    3659947482 / 9783659947483

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    Librería: preigu, Osnabrück, Alemaniapreigu

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    Taschenbuch. Condición: Neu. Improving Reliability of Tungsten Plug Via on an Integrated Circuitry | Process Flow in BiCMOS and CMOS technology with Failure Analysis,Design of Experiments,Statistical Analysis & Wafer Maps | Apek Mulay | Taschenbuch | Englisch | 2016 | LAP LAMBERT Academic Publishing | EAN 9783659947483 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu Print on Demand.…

  • Idioma: Inglés

    Editorial: LAP LAMBERT Academic Publishing Sep 2016, 2016

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    Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000

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    Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The failure of an electronic circuitry with Aluminum metal process due to electromigration degradation has been a continuous process of research and development in semiconductor industry. With the advent of Internet of Things (IoT) revolution in global semiconductor industry, there is an expected huge demand for analog ICs for healthcare, automotive and other consumer electronic applications. Analog ICs make use of Aluminum metal process as most of the analog applications do not need a state-of-the-art technology. Aluminum is not only cost effective in use but also easy to use in processing as compared to copper. However, Aluminum metal process is prone to electromigration failures. Hence, Electronic chips that make use of Aluminum metal process have to undergo rigorous tests for reliability related failures. When wafer yield becomes low due to electromigration related failures, it results into a huge loss for the semiconductor foundries because of the capital intensive nature of this business. Hence, Semiconductor Industry Professional should be equipped with detail process steps in order to improve the process yield including statistical analysis with Design of Experiments (DoE).VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 168 pp. Englisch.…