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Añadir al carritoCondición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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Añadir al carritoCondición: Used. pp. xviii + 508 1st Edition.
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Añadir al carritoCondición: Used. pp. xviii + 508.
Librería: Mispah books, Redhill, SURRE, Reino Unido
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Añadir al carritoHardcover. Condición: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
Librería: Ria Christie Collections, Uxbridge, Reino Unido
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Idioma: Inglés
Publicado por Springer Berlin Heidelberg, Springer Berlin Heidelberg, 2007
ISBN 10: 3540445005 ISBN 13: 9783540445005
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 320,99
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Añadir al carritoBuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - Earlier books on this subject, i.e. 'Sputtering by Particle Bombardment I - III' are nearly 20 years old, but since then a lot of new and important work has been performed and published in international journals. The planned book brings an overview about all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all colleagues, who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed, Molecular dynamics calculations have not been covered in the previous books on sputtering. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects, such as for hydrogen ion bombardment of carbon, are outlined. New developments, such as sputtering by MeV Ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter.
Librería: Majestic Books, Hounslow, Reino Unido
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Añadir al carritoCondición: Used. pp. xviii + 508 Illus. This item is printed on demand.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg, 2007
ISBN 10: 3540445005 ISBN 13: 9783540445005
Librería: moluna, Greven, Alemania
EUR 267,86
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Añadir al carritoGebunden. Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. State-of-the-art report covering theoretical as well as experimental aspects of sputteringWritten by leading expertsEarlier books on this subject, i.e. Sputtering by Particle Bombardment I - III are nearly 20 years old, but since then.
Librería: preigu, Osnabrück, Alemania
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Añadir al carritoBuch. Condición: Neu. Sputtering by Particle Bombardment | Experiments and Computer Calculations from Threshold to MeV Energies | Rainer Behrisch (u. a.) | Buch | Topics in Applied Physics | xvii | Englisch | 2007 | Springer | EAN 9783540445005 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg Jul 2007, 2007
ISBN 10: 3540445005 ISBN 13: 9783540445005
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 320,99
Cantidad disponible: 2 disponibles
Añadir al carritoBuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Earlier books on this subject, i.e. 'Sputtering by Particle Bombardment I - III' are nearly 20 years old, but since then a lot of new and important work has been performed and published in international journals. The planned book brings an overview about all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all colleagues, who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed, Molecular dynamics calculations have not been covered in the previous books on sputtering. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects, such as for hydrogen ion bombardment of carbon, are outlined. New developments, such as sputtering by MeV Ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter. 528 pp. Englisch.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg, Springer Berlin Heidelberg Jul 2007, 2007
ISBN 10: 3540445005 ISBN 13: 9783540445005
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemania
EUR 320,99
Cantidad disponible: 1 disponibles
Añadir al carritoBuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Earlier books on this subject, i.e. 'Sputtering by Particle Bombardment I - III' are nearly 20 years old, but since then a lot of new and important work has been performed and published in international journals. The planned book brings an overview about all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all colleagues, who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed, Molecular dynamics calculations have not been covered in the previous books on sputtering. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects, such as for hydrogen ion bombardment of carbon, are outlined. New developments, such as sputtering by MeV Ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 528 pp. Englisch.