Librería: Majestic Books, Hounslow, Reino Unido
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Librería: SMASS Sellers, IRVING, TX, Estados Unidos de America
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Librería: Basi6 International, Irving, TX, Estados Unidos de America
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Librería: Romtrade Corp., STERLING HEIGHTS, MI, Estados Unidos de America
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Librería: SMASS Sellers, IRVING, TX, Estados Unidos de America
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Librería: Books Puddle, New York, NY, Estados Unidos de America
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Añadir al carritoCondición: New. pp. 204.
Librería: Basi6 International, Irving, TX, Estados Unidos de America
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Librería: Romtrade Corp., STERLING HEIGHTS, MI, Estados Unidos de America
EUR 60,78
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Librería: Biblios, Frankfurt am main, HESSE, Alemania
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Añadir al carritoCondición: New. pp. 204.
Librería: SMASS Sellers, IRVING, TX, Estados Unidos de America
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Librería: SMASS Sellers, IRVING, TX, Estados Unidos de America
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Librería: Basi6 International, Irving, TX, Estados Unidos de America
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Librería: Romtrade Corp., STERLING HEIGHTS, MI, Estados Unidos de America
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Librería: Basi6 International, Irving, TX, Estados Unidos de America
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Librería: Stephen White Books, Bradford, Reino Unido
EUR 40,78
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Añadir al carritoHardcover. Condición: Good. Ex-library book, usual markings. Hardback/Hardcover. Clean copy in good condition. Quick dispatch from UK seller.
Librería: UK BOOKS STORE, London, LONDO, Reino Unido
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Añadir al carritoCondición: New. Brand New ! Fast Delivery "International Edition " and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 4-6 Working days .and we do have flat rate for up to 2LB. Extra shipping charges will be requested This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.
Librería: Ria Christie Collections, Uxbridge, Reino Unido
EUR 113,52
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Añadir al carritoCondición: New. In.
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Añadir al carritoGebunden. Condición: New. Includes an introduction to wireless sensor networksProblems specific to sensor node communications are described and addressedDesign methodologies presentedInvited chapters by leading research expertsIncludes an introduct.
Librería: UK BOOKS STORE, London, LONDO, Reino Unido
EUR 168,24
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Añadir al carritoHardcover. Condición: New. Brand New ! Fast Delivery "International Edition " and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 4-6 Working days .and we do have flat rate for up to 2LB. Extra shipping charges will be requested This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 114,36
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Añadir al carritoBuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - transconductance e ciency of all critical devices in order to reduce the n- essary bias current. However, reducing the current density also results in a severely decreased device f . An optimization of the current density is re- T quired to provide the correct balance between transconductance e ciency and bandwidth. Plots such as Figure 2. 1 are useful tools for designers when choosing appropriate transistor bias points. Technology scaling allows greatly increased f realization for a given IC. Thus, weak inversion biasing for RF T design will become increasingly useful in future technology nodes. Throughout this work, the IC of critical transistors will be discussed. Most of the RF devices are biased in moderate to weak inversion to achieve enhanced transconductance e ciency and reduced bias current. 2. 2 MEMS Background The relatively new eld of Radio Frequency Microelectro Mechanical Systems (RF MEMS) provides unique opportunities for RF transceiver designers. This section provides background on RF MEMS and provides insight into the - portunities presented by these new technologies. The eld of RF MEMS - cludes the design and utilization of RF lters, resonators, switches, and other passive mechanical structures constructed using bulk processed integrated c- cuit fabrication techniques. To date, these devices have been commercially used as discrete board-mounted components, primarily used to enhance the miniaturization of mobile phones. However, RF MEMS components have the potential to be batch fabricated using existing integrated circuit fabrication techniques.
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 106,99
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Añadir al carritoBuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -transconductance e ciency of all critical devices in order to reduce the n- essary bias current. However, reducing the current density also results in a severely decreased device f . An optimization of the current density is re- T quired to provide the correct balance between transconductance e ciency and bandwidth. Plots such as Figure 2. 1 are useful tools for designers when choosing appropriate transistor bias points. Technology scaling allows greatly increased f realization for a given IC. Thus, weak inversion biasing for RF T design will become increasingly useful in future technology nodes. Throughout this work, the IC of critical transistors will be discussed. Most of the RF devices are biased in moderate to weak inversion to achieve enhanced transconductance e ciency and reduced bias current. 2. 2 MEMS Background The relatively new eld of Radio Frequency Microelectro Mechanical Systems (RF MEMS) provides unique opportunities for RF transceiver designers. This section provides background on RF MEMS and provides insight into the - portunities presented by these new technologies. The eld of RF MEMS - cludes the design and utilization of RF lters, resonators, switches, and other passive mechanical structures constructed using bulk processed integrated c- cuit fabrication techniques. To date, these devices have been commercially used as discrete board-mounted components, primarily used to enhance the miniaturization of mobile phones. However, RF MEMS components have the potential to be batch fabricated using existing integrated circuit fabrication techniques. 184 pp. Englisch.