Pearton s j (75 resultados)

Paperback. Condición: Very Good. Special Issue. Previous Business Library Book. Stickers to front cover and spine. Interior clean and unmarked.

Hardcover. Condición: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.

Hardcover. Condición: New. No Jacket. 1st Edition.

Condición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.

Condición: Used. pp. 1024.

Condición: Used. pp. 1024.

Condición: Used. pp. 1024.

Paperback. Condición: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

Condición: New. Brand New! Fast Delivery This is an International Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.…

Condición: New.

Condición: As New. Unread book in perfect condition.

Condición: Good. *Price HAS BEEN REDUCED by 10% until Monday, Sept. 28 (weekend SALE item)* 653 pp., hardcover, ex library, else text clean and binding tight. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country. Photos available upon request.…

Condición: New.

Condición: New. 1997. 1st Edition. paperback. . . . . .

Condición: As New. Unread book in perfect condition.

Condición: New.

Condición: New.

Condición: New. pp. 456.

Condición: Très bon. Inp Hbts: Growth, Processing, and Applications | Jalali, Pearton | Artech House, 1995. In-8° cartonné, 421 pages. Couverture propre. Dos solide. Intérieur frais sans soulignage ou annotation. Exemplaire de bibliothèque : petit code barre en pied de 1re de couv., cotation au dos, rares et discrets petits tampons à l'intérieur de l'ouvrage. Très bon état général [NM51] Pour les expéditions internationales, nous consulter au préalable pour l ajustement des frais de port qui seront peut-être revus à la baisse/ For international shipments, please contact us in advance to adjust shipping costs. |. …

Condición: New.

Hardcover. Condición: Good+. No Dust Jacket. Materials Research Society Symposia Proceedings; 6.5 X 1.75 X 9.5 inches; 579 pages; graphs. Ex-Library copy with usual identifiers. Minor yellowing on pages. Very Good condition otherwise. No other noteworthy defects. No markings on text pages. ; - Your satisfaction is our priority. We offer free returns and respond promptly to all inquiries. Your item will be carefully cushioned in bubble wrap and securely boxed. All orders ship on the same or next business day. Buy with confidence. 1st Edition (Unstated); No Printing Stated.…

Condición: New. 1997. 1st Edition. paperback. . . . . . Books ship from the US and Ireland.

Condición: New. pp. 456.

Condición: New. In English.

Condición: Good. Pages intact with minimal writing/highlighting. The binding may be loose and creased. Dust jackets/supplements are not included. Stock photo provided. Product includes identifying sticker. Better World Books: Buy Books. Do Good.

Condición: Sehr gut. Zustand: Sehr gut | Seiten: 672 | Sprache: Englisch | Produktart: Bücher | Pattern transfer by dry etching and plasma-enhanced chemical vapor de­ position are two of the cornerstone techniques for modern integrated cir­ cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen­ sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi­ als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.…

Hardback. Condición: New.

Condición: New.

Condición: New.

Condición: New. InhaltsverzeichnisPart 1 Introduction: wet chemical etch mixtures for InP wet chemical etch mixtures for other III-V materials. Part 2 Growth of InP-based heterojunction bipolar transistors: substrate preparation growth behaviour and c.