Librería: BookDepart, Shepherdstown, WV, Estados Unidos de America
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Añadir al carritoHardcover. Condición: UsedGood. Hardcover; surplus library copy with the usual stampings; reference number written on spine; fading and shelf wear to exterior; otherwise contents in good condition with clean text, firm binding.
Idioma: Inglés
Publicado por New York / London. Plenum Press., 1980
ISBN 10: 0306402998 ISBN 13: 9780306402999
Librería: Antiquariat Löwenstein, Göllersdorf, NÖ, Austria
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Añadir al carritopp. VIII. 520. Cloth. In good condition. Unfortunately, deliveries to the USA are not possible at this time.
Publicado por plenum press NY 1980, 1980
Librería: Antiquariat Thomas & Reinhard, Recklinghausen, NRW, Alemania
EUR 18,00
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Añadir al carritoLeinen, 520 Seiten, dies ist ein regulär ausgesondertes Bibliotheksexemplar aus einer wissenschaftlichen Bibliothek, keine Markierungen/Anmerkungen, Einbandränder aufgehellt, das Buch ist gut erhalten --- Linen, Lib. Ex., 520 pages, no marks, cover margins brightened, the book is in a good condition. Shipping to abroad insured with tracking number.
Librería: Ria Christie Collections, Uxbridge, Reino Unido
EUR 60,68
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Añadir al carritoCondición: New. In.
Librería: Chiron Media, Wallingford, Reino Unido
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Añadir al carritoPF. Condición: New.
Librería: Books Puddle, New York, NY, Estados Unidos de America
EUR 81,71
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Añadir al carritoCondición: New. pp. 536.
Librería: preigu, Osnabrück, Alemania
EUR 50,25
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Añadir al carritoTaschenbuch. Condición: Neu. Site Characterization and Aggregation of Implanted Atoms in Materials | R. Coussement (u. a.) | Taschenbuch | 520 S. | Englisch | 2012 | Springer US | EAN 9781468410174 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 59,97
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Añadir al carritoTaschenbuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.
Idioma: Inglés
Publicado por Plenum New York, 1980
Librería: ralfs-buecherkiste, Herzfelde, MOL, Alemania
EUR 22,00
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Añadir al carritoCloth. Condición: Gut. 520 S. Ion implantation Congress Guter Zustand/ Good Ex-Library. With numerous ill.and figures. Cover faded at the edges and shows mild wear. ha1069803 Sprache: Englisch Gewicht in Gramm: 1060.
Librería: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 46,22
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Añadir al carritoCondición: new. Questo è un articolo print on demand.
Idioma: Inglés
Publicado por Springer US, Chapman And Hall/CRC Mär 2012, 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 53,49
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Añadir al carritoTaschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products. 536 pp. Englisch.
Librería: Majestic Books, Hounslow, Reino Unido
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Añadir al carritoCondición: New. Print on Demand pp. 536 67:B&W 6.69 x 9.61 in or 244 x 170 mm (Pinched Crown) Perfect Bound on White w/Gloss Lam.
Librería: Biblios, Frankfurt am main, HESSE, Alemania
EUR 79,63
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Añadir al carritoCondición: New. PRINT ON DEMAND pp. 536.
Idioma: Inglés
Publicado por Springer-Verlag New York Inc., 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Librería: THE SAINT BOOKSTORE, Southport, Reino Unido
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Añadir al carritoPaperback / softback. Condición: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.
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Añadir al carritoCondición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the .
Idioma: Inglés
Publicado por Springer US, Chapman And Hall/CRC Mär 2012, 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemania
EUR 53,49
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Añadir al carritoTaschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 536 pp. Englisch.