Isbn: 9783845471440 - synthesis and characterization of nc-ge using ion beam techniques: energetic ion beams for synthesis and characterization of germanium nanocrystals for fundamental and applied research (5 resultados)

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    Taschenbuch. Condición: Neu. Synthesis and Characterization of nc-Ge using Ion Beam techniques | Energetic Ion Beams for synthesis and Characterization of Germanium Nanocrystals for fundamental and applied research | Srinivasa Rao Nelamarri (u. a.) | Taschenbuch | 132 S. | Englisch | 2011 | LAP LAMBERT Academic Publishing | EAN 9783845471440 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu.…

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    Editorial: LAP LAMBERT Academic Publishing Sep 2011, 2011

    3845471441 / 9783845471440

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    Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.

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    Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The present book deals with the synthesis and characterization of Germanium (Ge) nanocrystals prepared by using various deposition methods, annealing processes and swift heavy ion irradiation. Even though different methods have been used to prepare Ge nanocrystals, researchers are looking for more compact and versatile synthesis methods for various industrial applications. Here, we have used Atom Beam Sputtering (ABS), RF sputtering and ion implantation for initial depositions. Subsequently these as-deposited samples were annealed at various temperatures using normal furnace annealing, rapid thermal annealing (RTA), microwave annealing and irradiated with swift heavy ions of various energies and fluences for crystallization. Advantages and limitations of these techniques have been discussed in detail. 132 pp. Englisch.…

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    Editorial: LAP LAMBERT Academic Publishing, 2011

    3845471441 / 9783845471440

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    Librería: moluna, Greven, Alemaniamoluna

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    Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Nelamarri Srinivasa RaoDr Srinivasa Rao Nelamarri is Post doctoral fellow and Prof Anand P Pathak, is Professor of Physics at the University of Hyderabad, India. Their main research interests include Ion Beam studies of nanomaterial.…

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    Editorial: LAP LAMBERT Academic Publishing Sep 2011, 2011

    3845471441 / 9783845471440

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    Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000

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    Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The present book deals with the synthesis and characterization of Germanium (Ge) nanocrystals prepared by using various deposition methods, annealing processes and swift heavy ion irradiation. Even though different methods have been used to prepare Ge nanocrystals, researchers are looking for more compact and versatile synthesis methods for various industrial applications. Here, we have used Atom Beam Sputtering (ABS), RF sputtering and ion implantation for initial depositions. Subsequently these as-deposited samples were annealed at various temperatures using normal furnace annealing, rapid thermal annealing (RTA), microwave annealing and irradiated with swift heavy ions of various energies and fluences for crystallization. Advantages and limitations of these techniques have been discussed in detail.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 132 pp. Englisch.…

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    Editorial: LAP LAMBERT Academic Publishing, 2011

    3845471441 / 9783845471440

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    Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH

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    Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The present book deals with the synthesis and characterization of Germanium (Ge) nanocrystals prepared by using various deposition methods, annealing processes and swift heavy ion irradiation. Even though different methods have been used to prepare Ge nanocrystals, researchers are looking for more compact and versatile synthesis methods for various industrial applications. Here, we have used Atom Beam Sputtering (ABS), RF sputtering and ion implantation for initial depositions. Subsequently these as-deposited samples were annealed at various temperatures using normal furnace annealing, rapid thermal annealing (RTA), microwave annealing and irradiated with swift heavy ions of various energies and fluences for crystallization. Advantages and limitations of these techniques have been discussed in detail.…