Idioma: Inglés
Publicado por Berlin ; Heidelberg : Springer, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Librería: Kepler-Buchversand Huong Bach, Weil der Stadt, Alemania
EUR 29,00
Cantidad disponible: 1 disponibles
Añadir al carritoGr.-8°, gebundene Ausgabe. Condición: Sehr gut. XIII, 104 S. : graph. Darst. Gebraucht: sehr guter Zustand. Contents: Introduction / The MOS STructure / The MOS Oxide and its Defects / Review of Transport Mechanism in Thin Oxides / of MOS Devices / Experimental Techniques / Theoretical Approaches of Mobile Ions Density Distribution Determination / Theoretical Model of Mobile Ions Distribution and Ionic Current in the MOS Oxide / Index. Sprache: Englisch Gewicht in Gramm: 315.
Librería: Romtrade Corp., STERLING HEIGHTS, MI, Estados Unidos de America
EUR 76,82
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Librería: Basi6 International, Irving, TX, Estados Unidos de America
EUR 76,82
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Librería: Ria Christie Collections, Uxbridge, Reino Unido
EUR 115,69
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: New. In.
Librería: Buchpark, Trebbin, Alemania
EUR 29,00
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher | This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
Librería: Buchpark, Trebbin, Alemania
EUR 29,87
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Hervorragend. Zustand: Hervorragend | Sprache: Englisch | Produktart: Bücher | This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
Librería: Revaluation Books, Exeter, Reino Unido
EUR 153,50
Cantidad disponible: 2 disponibles
Añadir al carritoHardcover. Condición: Brand New. 104 pages. 9.00x6.25x0.75 inches. In Stock.
Librería: Mispah books, Redhill, SURRE, Reino Unido
EUR 142,10
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg, Springer Berlin Heidelberg, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 106,99
Cantidad disponible: 1 disponibles
Añadir al carritoBuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.
Librería: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 86,24
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: new. Questo è un articolo print on demand.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg Jan 2011, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 106,99
Cantidad disponible: 2 disponibles
Añadir al carritoBuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures. 120 pp. Englisch.
Idioma: Inglés
Publicado por Springer Berlin Heidelberg, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Librería: moluna, Greven, Alemania
EUR 92,27
Cantidad disponible: Más de 20 disponibles
Añadir al carritoGebunden. Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Reviewed state-of-the-art Comprehensive for students Improves the understanding of transport phenomenaThis book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) proper.
Idioma: Inglés
Publicado por Springer, Springer Jan 2011, 2011
ISBN 10: 3642163033 ISBN 13: 9783642163036
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemania
EUR 106,99
Cantidad disponible: 1 disponibles
Añadir al carritoBuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book focuses on the importance of mobile ions presented in oxide structures, what significantly affects the metal-oxide-semiconductor (MOS) properties. The reading starts with the definition of the MOS structure, its various aspects and different types of charges presented in their structure. A review on ionic transport mechanisms and techniques for measuring the mobile ions concentration in the oxides is given, special attention being attempted to the Charge Pumping (CP) technique associated with the Bias Thermal Stress (BTS) method. Theoretical approaches to determine the density of mobile ions as well as their distribution along the oxide thickness are also discussed. The content varies from general to very specific examples, helping the reader to learn more about transport in MOS structures.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 120 pp. Englisch.