9783642095368 - reactive sputter deposition: 109 (springer series in materials science, 109) (7 resultados)
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Condición: Bueno. : Este libro trata sobre la deposición por pulverización reactiva, abordando los fundamentos y aplicaciones de esta técnica en la ciencia de los materiales. Explora los procesos físicos y químicos involucrados en la creación de películas delgadas mediante la pulverización reactiva, ofreciendo una visión detalla…da para estudiantes y profesionales del campo. EAN: 9783642095368 Tipo: Libros Categoría: Ciencias|Tecnología Título: Reactive Sputter Deposition Autor: Diederik Depla| Stijn Mahieu Páginas: 590 Formato: tapa blanda.
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Taschenbuch. Condición: Neu. Reactive Sputter Deposition | Diederik Depla (u. a.) | Taschenbuch | Springer Series in Materials Science | xviii | Englisch | 2010 | Springer | EAN 9783642095368 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com |… Anbieter: preigu.
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Taschenbuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic.…Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.
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Condición: new. Questo è un articolo print on demand.
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Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable re…ference work for.
Idioma: Inglés
Editorial: Springer Berlin Heidelberg, Springer Berlin Heidelberg Nov 2010, 2010
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Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.
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Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year… on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.
Idioma: Inglés
Editorial: Springer Berlin Heidelberg, Springer Berlin Heidelberg Nov 2010, 2010
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Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemaniabuchversandmimpf2000
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Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on…this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.
