Librería: Revaluation Books, Exeter, Reino Unido
EUR 39,63
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Añadir al carritoHardcover. Condición: Brand New. 1st edition. 110 pages. 9.09x6.00x0.25 inches. In Stock.
Librería: Majestic Books, Hounslow, Reino Unido
EUR 46,03
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Añadir al carritoCondición: New. pp. 110.
Idioma: Inglés
Publicado por William Andrew 2013-11-18, 2013
ISBN 10: 0323241433 ISBN 13: 9780323241434
Librería: Chiron Media, Wallingford, Reino Unido
EUR 36,15
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Añadir al carritoPaperback. Condición: New.
Librería: Books Puddle, New York, NY, Estados Unidos de America
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Añadir al carritoCondición: New. pp. 110 1st Edition.
Librería: Biblios, Frankfurt am main, HESSE, Alemania
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Añadir al carritoCondición: New. pp. 110.
Idioma: Inglés
Publicado por William Andrew Publishing, 2013
ISBN 10: 0323241433 ISBN 13: 9780323241434
Librería: THE SAINT BOOKSTORE, Southport, Reino Unido
EUR 47,83
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Añadir al carritoPaperback / softback. Condición: New. New copy - Usually dispatched within 4 working days.
Librería: preigu, Osnabrück, Alemania
EUR 40,85
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Añadir al carritoTaschenbuch. Condición: Neu. New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices | Zeev Zalevsky (u. a.) | Taschenbuch | Englisch | 2013 | Elsevier Science | EAN 9780323241434 | Verantwortliche Person für die EU: Zeitfracht Medien GmbH, Ferdinand-Jühlke-Str. 7, 99095 Erfurt, produktsicherheit[at]zeitfracht[dot]de | Anbieter: preigu.
Librería: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 39,47
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Añadir al carritoCondición: new. Questo è un articolo print on demand.
Idioma: Inglés
Publicado por Elsevier Science Nov 2013, 2013
ISBN 10: 0323241433 ISBN 13: 9780323241434
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 38,95
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Añadir al carritoTaschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel 'smart' image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips. 110 pp. Englisch.
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 45,67
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Añadir al carritoTaschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel 'smart' image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips.