ISBN: 9780323241434 - new approaches to image processing based failure analysis of nano-scale ulsi devices (micro and nano technologies) (4 resultados)

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  • Idioma: Inglés

    Editorial: William Andrew Pub, 2013

    0323241433 / 9780323241434

    Serie: Libro 55 de 393 - Micro and Nano Technologies

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    Librería: Revaluation Books, Exeter, Reino UnidoRevaluation Books

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    Condición: Nuevo

    EUR 72,27

    Envío por EUR 11,94 
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    Cantidad disponible: 1 disponible

    Hardcover. Condición: Brand New. 1st edition. 110 pages. 9.09x6.00x0.25 inches. In Stock.

  • Idioma: Inglés

    Editorial: Elsevier Science, 2013

    0323241433 / 9780323241434

    Serie: Libro 55 de 393 - Micro and Nano Technologies

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    Librería: preigu, Osnabrück, Alemaniapreigu

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    Condición: Nuevo

    EUR 40,85

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    Cantidad disponible: 5 disponibles

    Taschenbuch. Condición: Neu. New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices | Zeev Zalevsky (u. a.) | Taschenbuch | Englisch | 2013 | Elsevier Science | EAN 9780323241434 | Verantwortliche Person für die EU: Elsevier B.V., Radarweg 29, 1043 NX AMSTERDAM, NIEDERLANDE, productsafety[at]elsevier[dot]com | Anbieter: preigu. …

  • Idioma: Inglés

    Editorial: Elsevier Science Nov 2013, 2013

    0323241433 / 9780323241434

    Serie: Libro 55 de 393 - Micro and Nano Technologies

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    Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, AlemaniaBuchWeltWeit Ludwig Meier e.K.

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    Condición: Nuevo

    EUR 38,95

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    Cantidad disponible: 2 disponibles

    Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel 'smart' image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips. 110 pp. Englisch.…

  • Idioma: Inglés

    Editorial: Elsevier Science, 2013

    0323241433 / 9780323241434

    Serie: Libro 55 de 393 - Micro and Nano Technologies

    • Tapa blanda
    • Impresión bajo demanda

    Librería: AHA-BUCH GmbH, Einbeck, AlemaniaAHA-BUCH GmbH

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    Condición: Nuevo

    EUR 50,80

    Envío por EUR 35,00 
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    Cantidad disponible: 2 disponibles

    Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures. Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can't keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise. This book presents novel 'smart' image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips. The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips. …