Librería: ThriftBooks-Atlanta, AUSTELL, GA, Estados Unidos de America
EUR 14,04
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
Librería: ThriftBooks-Dallas, Dallas, TX, Estados Unidos de America
EUR 14,04
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.
Librería: Basi6 International, Irving, TX, Estados Unidos de America
EUR 53,73
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Librería: Romtrade Corp., STERLING HEIGHTS, MI, Estados Unidos de America
EUR 54,34
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
Idioma: Inglés
Publicado por William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: Books Puddle, New York, NY, Estados Unidos de America
EUR 55,17
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: New. pp. 672.
Idioma: Inglés
Publicado por William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: Majestic Books, Hounslow, Reino Unido
EUR 51,25
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: New. pp. 672 Illus.
Librería: ALLBOOKS1, Direk, SA, Australia
EUR 61,90
Cantidad disponible: 1 disponibles
Añadir al carritoBrand new book. Fast ship. Please provide full street address as we are not able to ship to P O box address.
Idioma: Inglés
Publicado por William Andrew 1991-01-01, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: Chiron Media, Wallingford, Reino Unido
EUR 45,98
Cantidad disponible: Más de 20 disponibles
Añadir al carritoHardcover. Condición: New.
Idioma: Inglés
Publicado por D. S. Brewer, Cambridge, 2025
ISBN 10: 1843846985 ISBN 13: 9781843846987
Librería: Daedalus Books, Portland, OR, Estados Unidos de America
Miembro de asociación: CBA
EUR 60,98
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Near Fine. A nice, bright copy. ; 6.5 X 1 X 9.75 inches; 266 pages.
Librería: GreatBookPrices, Columbia, MD, Estados Unidos de America
EUR 63,54
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: New.
Idioma: Inglés
Publicado por William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: Biblios, Frankfurt am main, HESSE, Alemania
EUR 55,09
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: New. pp. 672.
Librería: GreatBookPricesUK, Woodford Green, Reino Unido
EUR 61,58
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: New.
Librería: Ria Christie Collections, Uxbridge, Reino Unido
EUR 64,62
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: New. In.
Librería: GreatBookPricesUK, Woodford Green, Reino Unido
EUR 72,67
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: As New. Unread book in perfect condition.
Librería: Hay-on-Wye Booksellers, Hay-on-Wye, HEREF, Reino Unido
EUR 23,87
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: As New.
Librería: GreatBookPrices, Columbia, MD, Estados Unidos de America
EUR 99,89
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: As New. Unread book in perfect condition.
Librería: Broad Street Books, Branchville, NJ, Estados Unidos de America
EUR 108,97
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: As New. Hardcover book in excellent condition, text is unmarked and pages are tight.
Idioma: Inglés
Publicado por Elsevier Science & Technology|William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: moluna, Greven, Alemania
EUR 73,78
Cantidad disponible: Más de 20 disponibles
Añadir al carritoGebunden. Condición: New. Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and x-ray lithography.This han.
EUR 126,23
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.
Librería: Mispah books, Redhill, SURRE, Reino Unido
EUR 292,53
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Like New. Like New. book.
Librería: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 53,13
Cantidad disponible: Más de 20 disponibles
Añadir al carritoCondición: new. Questo è un articolo print on demand.
Librería: Revaluation Books, Exeter, Reino Unido
EUR 53,24
Cantidad disponible: 2 disponibles
Añadir al carritoHardcover. Condición: Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock. This item is printed on demand.
Idioma: Inglés
Publicado por Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
EUR 54,95
Cantidad disponible: 2 disponibles
Añadir al carritoBuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. Englisch.
Idioma: Inglés
Publicado por Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 66,28
Cantidad disponible: 2 disponibles
Añadir al carritoBuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.