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Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles: 9 (Topics in Organometallic Chemistry) - Tapa blanda
Sinopsis
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
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Reseña del editor
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
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Precursor Chemistry of Advanced Materials (eng)
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Precursor Chemistry of Advanced Materials
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Springer Berlin Heidelberg Feb 2010, 2010
ISBN 10: 3642056881
ISBN 13: 9783642056888
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Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors. 232 pp. Englisch. Nº de ref. del artículo: 9783642056888
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Precursor Chemistry of Advanced Materials
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Springer Berlin Heidelberg, 2010
ISBN 10: 3642056881
ISBN 13: 9783642056888
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Tapa blanda
Librería: moluna, Greven, Alemania
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Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Each volume of Topics in Organometallic Chemistry provides the broad scientific readership with comprehensive summary and critical overview of a topic in organometallic chemistryResearch in this rapidly developing transdisciplinary field . Nº de ref. del artículo: 5044821
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Precursor Chemistry of Advanced Materials : Cvd, Ald and Nanoparticles
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Precursor Chemistry of Advanced Materials | CVD, ALD and Nanoparticles
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Taschenbuch. Condición: Neu. Precursor Chemistry of Advanced Materials | CVD, ALD and Nanoparticles | Roland A. Fischer | Taschenbuch | Topics in Organometallic Chemistry | xvii | Englisch | 2010 | Springer | EAN 9783642056888 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu. Nº de ref. del artículo: 107220283
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Precursor Chemistry of Advanced Materials : Cvd, Ald and Nanoparticles
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Precursor Chemistry of Advanced Materials : CVD, ALD and Nanoparticles
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Taschenbuch. Condición: Neu. Druck auf Anfrage Neuware - Printed after ordering - Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors. Nº de ref. del artículo: 9783642056888
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Precursor Chemistry of Advanced Materials
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Springer Berlin Heidelberg, Springer Berlin Heidelberg Feb 2010, 2010
ISBN 10: 3642056881
ISBN 13: 9783642056888
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Taschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 232 pp. Englisch. Nº de ref. del artículo: 9783642056888
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Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles (Topics in Organometallic Chemistry, 9)
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Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles
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Springer Berlin Heidelberg, 2005
ISBN 10: 3642056881
ISBN 13: 9783642056888
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Paperback. Condición: Brand New. 230 pages. 9.00x6.00x0.53 inches. In Stock. Nº de ref. del artículo: x-3642056881
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