Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
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Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
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Librería: Buchpark, Trebbin, Alemania
Condición: Sehr gut. Zustand: Sehr gut | Seiten: 554 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar. Nº de ref. del artículo: 36116527/202
Cantidad disponible: 1 disponibles