High-Resolution X-Ray Scattering: From Thin Films to Lateral Nanostructures (Advanced Texts in Physics) - Tapa dura

Baumbach, Tilo; Pietsch, Ullrich; Holy, Vaclav

 
9780387400921: High-Resolution X-Ray Scattering: From Thin Films to Lateral Nanostructures (Advanced Texts in Physics)
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ISBN 10: 0387400923 ISBN 13: 9780387400921
Editorial: Springer, 2004

Sinopsis

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap­ pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

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Reseña del editor

During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap­ pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.

Reseña del editor

The book presents a detailed description of high-resolution x-ray scattering methods suitable for the investigation of the real structure of single-crystalline layers and multilayers, including structure defects in the layers and at the interfaces. Particular attention is devoted to lateral structures in semiconductors and semiconductor multilayers such as quantum wires and quantum dots. Both the theoretical background and the application of the methods are discussed. The second edition is extended to deal with lateral surface nanostructures such as gratings and dots, new examples for measuring layer thickness, lattice mismatch, and surface/interface roughness. The book will be an invaluable source for graduates and scientists.

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Editorial
Springer
Año de publicación
2004
Idioma
Inglés
ISBN 10 
0387400923
ISBN 13 
9780387400921
Encuadernación
Tapa dura
Número de edición
2
Número de páginas
428
Contacto del fabricante
Springer-Verlag GmbH
customerservice@springernature.com

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Heidelberg
Baden-Württemberg
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Alemania

Otras ediciones populares con el mismo título

9781441923073: High-Resolution X-Ray Scattering: From Thin Films to Lateral Nanostructures (Advanced Texts in Physics)

Edición Destacada

ISBN 10:  1441923071 ISBN 13:  9781441923073
Editorial: Springer, 2011
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