With illustrations. Stamped Damaged to verso title page. Otherwise new. ; Hardcover; Octavo; As technologists consider scaling microelectronic devices below the 100nm node, it is clear that many new materials will be introduced into the fab line. Determining the best materials and the best processing techniques are extremely challenging tasks. Much of this book, first published in 2002, attempts to find a replacement for silicon dioxide. Hafnium dioxide, zirconium dioxide, and their silicates and aluminates are the subjects of intense scrutiny, but other materials are being considered as well. Obtaining a suitable large capacitance, while simultaneously obtaining low charge density in the film, and finding a material that has adequate thermal stability is proving difficult. Real-time electron microscopy of metal-silicon reactions is providing valuable new insights. Topics include: high-K materials; processing of high-K gate dielectrics; gate stack and silicide issues in Si processing; electrical performance of novel gate dielectrics; novel gate structures; novel silicide processes; and shallow junctions and integration issues in FEOL.

N� de ref. del art�culo 21203

Contactar al vendedor

Denunciar este art�culo

Detalles bibliogr�ficos

T�tulo: Gate Stack and Silicide Issues in Silicon Processing II : Symposium Held April 17-19, 2001, San Francisco, California, U. S. A.
Editor: Materials Research Society, Warrendale, Pennsylvania
Fecha de publicaci�n: 2002
Idioma: Ingl�s
ISBN 10: 1558996060
ISBN 13: 9781558996069
Encuadernaci�n: Original Boards
Edici�n: First Edition; First Edition.
Estado: As New
Estado de la sobrecubierta: No Dust Jacket

Acerca de

Sinopsis

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2002.

Rese�a del editor

As technologists consider scaling microelectronic devices below the 100nm node, it is clear that many new materials will be introduced into the fab line. Determining the best materials and the best processing techniques are extremely challenging tasks. Much of this book, first published in 2002, attempts to find a replacement for silicon dioxide. Hafnium dioxide, zirconium dioxide, and their silicates and aluminates are the subjects of intense scrutiny, but other materials are being considered as well. Obtaining a suitable large capacitance, while simultaneously obtaining low charge density in the film, and finding a material that has adequate thermal stability is proving difficult. Real-time electron microscopy of metal-silicon reactions is providing valuable new insights. Topics include: high-K materials; processing of high-K gate dielectrics; gate stack and silicide issues in Si processing; electrical performance of novel gate dielectrics; novel gate structures; novel silicide processes; and shallow junctions and integration issues in FEOL.

"Sobre este t�tulo" puede pertenecer a otra edici�n de este libro.

Descripci�n de la librer�a

Please come visit our shop in Machynlleth or browse our stock online. We carry a wide range of academic books on all subjects, such as history, philosophy, psychology, psychiatry, mathematics, physics, geography, political science, political philosophy, religious studies, military history and many other subjects. We also carry antiquarian stock and general stock, especially cookery. We are always interested in collections, especially on academic subjects.

Ver la p�gina web de la librer�a

Miembro de asociaci�n

Los miembros de estas asociaciones est�n comprometidos a mantener los est�ndares m�s altos. Ellos garantizan la autenticidad de los art�culos que ofrecen a la venta. Tienen descripciones expertas y detalladas, se�alan los defectos significativos y/o restauraciones, muestran los precios exactos y llevan a cabo un servicio de imparcialidad y honestidad durante la experiencia de la compra.

Informaci�n empresarial del vendedor

Literary Cat Books
United Kingdom

Condiciones de venta y env�o

Condiciones de venta

All orders of 50 pounds and higher will be shipped with mandatory insurance added.

We make every effort to describe each book or print accurately. However, we accept that an item might not prove to be as you expected it, or has been damaged in transport. We therefore accept returns within 14 days of receipt of the item, upon prior notification. We will provide a full refund upon receipt of the returned item by us.

Condiciones de env�o

Orders usually ship within 2/3 business days. Shipping costs are based on books weighing 2.2 LB, or 1 KG. If your book order is heavy or oversized, we may contact you to let you know if extra shipping is required.

Overseas postage will be sent by airmail if you select priority and surface if you select standard postage. Surface mail to the United States or Canada can take up to six weeks, and up to twelve weeks to Australia and New Zealand.

We use only good quality materials and the utmost care when packaging our books to ensure they arrive in the best possible condition.

In the unlikely event that your book does not arrive within the specified shipping period, please feel free to contact us direct. Please provide your name, address and the details of your order.