Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Basi6 International, Irving, TX, Estados Unidos de America
EUR 50,43
Cantidad disponible: 1 disponibles
Añadir al carritoCondición: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Andreas Schüller, Chemnitz, Alemania
Original o primera edición
EUR 27,00
Cantidad disponible: 1 disponibles
Añadir al carritoHardcover. Condición: Befriedigend. 1. Auflage. Ausgesondertes Bibliotheksexemplar mit Signatur, Barcode, Rest d. Leihzettels, Stempeln etc. Zum Studium noch bestens geeignet. 375 In englischer Sprache. 160 pages. 16x22cm.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: GreatBookPrices, Columbia, MD, Estados Unidos de America
EUR 62,00
Cantidad disponible: 2 disponibles
Añadir al carritoCondición: New.
Idioma: Inglés
Publicado por World Scientific Publishing Co Pte Ltd, SG, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Rarewaves.com USA, London, LONDO, Reino Unido
EUR 64,40
Cantidad disponible: 1 disponibles
Añadir al carritoHardback. Condición: New. Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: GreatBookPrices, Columbia, MD, Estados Unidos de America
EUR 68,12
Cantidad disponible: 2 disponibles
Añadir al carritoCondición: As New. Unread book in perfect condition.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: GreatBookPricesUK, Woodford Green, Reino Unido
EUR 59,86
Cantidad disponible: 2 disponibles
Añadir al carritoCondición: New.
Idioma: Inglés
Publicado por World Scientific Pub Co Inc, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Revaluation Books, Exeter, Reino Unido
EUR 66,54
Cantidad disponible: 2 disponibles
Añadir al carritoHardcover. Condición: Brand New. 147 pages. 9.00x6.50x0.50 inches. In Stock.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: GreatBookPricesUK, Woodford Green, Reino Unido
EUR 70,63
Cantidad disponible: 2 disponibles
Añadir al carritoCondición: As New. Unread book in perfect condition.
Idioma: Inglés
Publicado por World Scientific Publishing Company, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Ria Christie Collections, Uxbridge, Reino Unido
EUR 79,15
Cantidad disponible: 4 disponibles
Añadir al carritoCondición: New. In.
Idioma: Inglés
Publicado por WORLD SCIENTIFIC PUB CO INC, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: moluna, Greven, Alemania
EUR 71,83
Cantidad disponible: 2 disponibles
Añadir al carritoGebunden. Condición: New. KlappentextrnrnBased on lecture notes that have been used by the authors for the past ten years, with revisions made each year, this book introduces the concept of thin-film physics and technology, describes the various deposition procedures and.
Idioma: Inglés
Publicado por World Scientific Publishing Co Pte Ltd, SG, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: Rarewaves.com UK, London, Reino Unido
EUR 59,87
Cantidad disponible: 1 disponibles
Añadir al carritoHardback. Condición: New. Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.
Idioma: Inglés
Publicado por World Scientific Publishing Company Sep 1994, 1994
ISBN 10: 9810216165 ISBN 13: 9789810216160
Librería: AHA-BUCH GmbH, Einbeck, Alemania
EUR 90,00
Cantidad disponible: 2 disponibles
Añadir al carritoBuch. Condición: Neu. Neuware - Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics -- ferromagnetic films, diffusion in thin films and mechanical properties of thin films -- are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.