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ISBN 10: 3659295337 ISBN 13: 9783659295331
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Idioma: Inglés
Publicado por LAP LAMBERT Academic Publishing, 2012
ISBN 10: 3659295337 ISBN 13: 9783659295331
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Añadir al carritoTaschenbuch. Condición: Neu. Synthesis of Titanium Based Nitride Thin Films By Plasma Focus | Application of Dense Plasma Focus System (DPF) in Materials Science | Tousif Hussain (u. a.) | Taschenbuch | 168 S. | Englisch | 2012 | LAP LAMBERT Academic Publishing | EAN 9783659295331 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
Idioma: Inglés
Publicado por LAP LAMBERT Academic Publishing, 2012
ISBN 10: 3659295337 ISBN 13: 9783659295331
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Idioma: Inglés
Publicado por LAP LAMBERT Academic Publishing Nov 2012, 2012
ISBN 10: 3659295337 ISBN 13: 9783659295331
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
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Añadir al carritoTaschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics. 168 pp. Englisch.
Idioma: Inglés
Publicado por LAP LAMBERT Academic Publishing Nov 2012, 2012
ISBN 10: 3659295337 ISBN 13: 9783659295331
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemania
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Añadir al carritoTaschenbuch. Condición: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 168 pp. Englisch.
Idioma: Inglés
Publicado por LAP LAMBERT Academic Publishing, 2012
ISBN 10: 3659295337 ISBN 13: 9783659295331
Librería: AHA-BUCH GmbH, Einbeck, Alemania
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Añadir al carritoTaschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.