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Transient Properties of HiPIMS Discharges | Anurag Mishra | Taschenbuch | 212 S. | Englisch | 2014 | Scholars' Press | EAN 9783639716467 | Verantwortliche Person für die EU: BoD - Books on Demand, In de Tarpen 42, 22848 Norderstedt, info[at]bod[dot]de | Anbieter: preigu. N° de ref. del artículo 105255543
HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.
Reseña del editor: HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.
Título: Transient Properties of HiPIMS Discharges
Editorial: Scholars' Press
Año de publicación: 2014
Encuadernación: Taschenbuch
Condición: Neu
Librería: moluna, Greven, Alemania
Condición: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Mishra AnuragDr. Anurag Mishra is a senior researcher in Advanced Material Science and Engineering, Sungkyunkwan University, South Korea. He has his PhD from The University of Liverpool, United Kingdom. His work is on transient pheno. Nº de ref. del artículo: 4999667
Cantidad disponible: Más de 20 disponibles
Librería: buchversandmimpf2000, Emtmannsberg, BAYE, Alemania
Taschenbuch. Condición: Neu. Neuware -HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 212 pp. Englisch. Nº de ref. del artículo: 9783639716467
Cantidad disponible: 2 disponibles
Librería: AHA-BUCH GmbH, Einbeck, Alemania
Taschenbuch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions. Nº de ref. del artículo: 9783639716467
Cantidad disponible: 1 disponibles
Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
Taschenbuch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions. 212 pp. Englisch. Nº de ref. del artículo: 9783639716467
Cantidad disponible: 1 disponibles
Librería: Books Puddle, New York, NY, Estados Unidos de America
Condición: New. Nº de ref. del artículo: 26128121558
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Librería: Biblios, Frankfurt am main, HESSE, Alemania
Condición: New. Nº de ref. del artículo: 18128121564
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Librería: Majestic Books, Hounslow, Reino Unido
Condición: New. Nº de ref. del artículo: 131417353
Cantidad disponible: 4 disponibles