Neuware -Earlier books on this subject, i.e. 'Sputtering by Particle Bombardment I - III' are nearly 20 years old, but since then a lot of new and important work has been performed and published in international journals. The planned book brings an overview about all the new results. This concerns especially a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields. This is especially useful for all colleagues, who need sputtering yields for physics and/or applied problems. The computational methods for calculating sputtering yields are critically reviewed, Molecular dynamics calculations have not been covered in the previous books on sputtering. The influence of chemical effects on sputtering and the new models developed in the last years for understanding these effects, such as for hydrogen ion bombardment of carbon, are outlined. New developments, such as sputtering by MeV Ions and the mechanisms for understanding the effects are presented. The new results about the angular and energy distributions of sputtered atoms are presented in an extra chapter.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 528 pp. Englisch.

N� de ref. del art�culo 9783642079443

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Detalles bibliogr�ficos

T�tulo: Sputtering by Particle Bombardment
Editor: Springer Berlin Heidelberg, Springer Berlin Heidelberg Nov 2010
Fecha de publicaci�n: 2010
Idioma: Ingl�s
ISBN 10: 364207944X
ISBN 13: 9783642079443
Encuadernaci�n: Taschenbuch
Estado: Neu
Dimensiones: 235�mil�metros de ancho por 155 de alto por 29 de largo
Peso: 791 gramos

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Sinopsis

This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.

De la contraportada

<p>This volume gives a comprehensive overview about the physical processes causing sputtering of solids at bombardment with energetic ions. The most important quantities are the sputtering yields, i.e. the average number of atoms eroded per incident ion. The latest results for the sputtering yields and their dependence on the incident energy and angle of incidence, as well as the energy and angular distributions of the sputtered atoms are presented. This concerns experimentally determined yields as well as a critical evaluation of the computational methods used to calculate the yields and distributions. The energies of the incident ions cover the range between a few eV up to several MeV. The influence of chemical effects between the incident ions and the atoms of the bombarded solid on the sputtering yields are also reviewed.</p>

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