Hardcover. Significant experimental work is devoted to the preparation of one and zero dimensional semiconductor structures in view of future electronic and optical devices which involve quantum effects. The aim is good control in the realization of nanometer structures both in vertical and lateral direction. Conventional processing techniques based on lithography face inherent problems such as limited resolution and surface defects caused by reactive ion etching. During the last few years several research groups started working on direct syntheses of semiconductor nanostructures by combining epitaxial growth techniques such as molecular beam epitaxy and chemical vapour deposition with pre-patterning of the substrate wafers. Another idea is based on island formation in strained layer heteroepitaxy. Zero and one dimensional structures with dimensions down to a few atomic distances have been realized this way. An important point is that the size of the quantum structures is controlled within the epitaxial deposition in a self-adjusting process.The main subjects of the book are: theoretical aspects of epitaxial growth, self-assembling nanostructures and cluster formation, epitaxial growth in tilted and non-(001) surfaces, cleaved edge overgrowth, nanostructure growth on patterned silicon substrates, nanostructures prepared by selective area epitaxy or growth on patterned substrates, in-situ etching and device applications based on epitaxial regrowth on patterned substrates. The experimental work mainly concentrated on GaAs/A1GaAs, GaAs/InGaAs, InGaP/InP and Si/SiGe based semiconductor heterostructures. Growth related problems received special attention. The different concepts for preparation of low dimensional structures are presented to allow direct comparison and to identify new concepts for future research work. Proceedings of the NATO Advanced Research Workshop, Ringberg in Rottach Egern, Germany, February 20--24, 1995 Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.

N� de ref. del art�culo 9780792336792

Contactar al vendedor

Denunciar este art�culo

Detalles bibliogr�ficos

T�tulo: Low Dimensional Structures Prepared by Epitaxial Growth or Regrowth on Patterned Substrates (Hardcover)
Editor: Kluwer Academic Publishers, Dordrecht
Fecha de publicaci�n: 1995
Idioma: Ingl�s
ISBN 10: 0792336798
ISBN 13: 9780792336792
Encuadernaci�n: Hardcover
Estado: new

Acerca de

Sinopsis

Significant experimental work is devoted to the preparation of one and zero dimensional semiconductor structures in view of future electronic and optical devices which involve quantum effects. The aim is good control in the realisation of nanometer structures both in vertical and lateral direction. Conventional processing techniques based on lithography face inherent problems such as limited resolution and surface defects caused by reactive ion etching.
During the last few years several research groups started working on direct syntheses of semiconductor nanostructures by combining epitaxial growth techniques such as molecular beam epitaxy and chemical vapour deposition with pre patterning of the substrate wafers. Another idea is based on island formation in strained layer heteroepitaxy. Zero and one dimensional structures with dimensions down to a few atomic distances have been realised this way. An important point is that the size of the quantum structures is controlled within the epitaxial deposition in a self-adjusting process.
The main subjects of the book are: Theoretical aspects of epitaxial growth, selfassembling nanostructures and cluster formation, epitaxial growth in tilted and non-(001) surfaces, cleaved edge overgrowth, nanostructure growth on patterned silicon substrates, nanostructures prepared by selective area epitaxy or growth on patterned substrates, in-situ etching and device applications based on epitaxial regrowth on patterned substrates.
The experimental work mainly concentrated on GaAs/A1GaAs, GaAs/InGaAs, InGaP/InP and Si/SiGe based semiconductor heterostructures. Growth related problems received special attention. The different concepts for preparation of low dimensional structures are presented to allow direct comparison and to identify new concepts for future research work.

Rese�a del editor

Proceedings of the NATO Advanced Research Workshop, Ringberg in Rottach Egern, Germany, February 20--24, 1995

"Sobre este t�tulo" puede pertenecer a otra edici�n de este libro.

Descripci�n de la librer�a

Ver la p�gina web de la librer�a

Informaci�n empresarial del vendedor

The Nile Group Pty Ltd
42 Apex Drive, Truganina, VIC, 3029, Australia

Condiciones de venta y env�o

Condiciones de venta

We guarantee the condition of every book as it's described on the Abebooks web sites. If you're dissatisfied with your purchase (Incorrect Book/Not as Described/Damaged) or if the order hasn't arrived, you're eligible for a refund within 30 days of the estimated delivery date. If you've changed your mind about a book that you've ordered, please use the Ask bookseller a question link to contact us and we'll respond within 2 business days.

Derecho a cancelaci�n

Condiciones de env�o

Please note that titles are dispatched from our UK and NZ warehouse. Delivery times specified in shipping terms. Orders ship within 2 business days. Delivery to your door then takes 8-15 days.

Tarifas de env�o de Australia a Estados Unidos de America

Tarifas de env�o de Australia a Estados Unidos de America
Cantidad del pedido	De 25 a 45 d�as h�biles	De 8 a 14 d�as h�biles
Primer art�culo	EUR 31.85	EUR 37.87

Los plazos de entrega los establecen los vendedores y var�an seg�n el transportista y la ubicaci�n. Los pedidos que pasan por la aduana pueden sufrir retrasos y los compradores son responsables de los aranceles o tarifas asociadas. Los vendedores pueden ponerse en contacto con usted en relaci�n con cargos adicionales para cubrir cualquier aumento en los costes de env�o de los art�culos.