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The item might be beaten up but readable. May contain markings or highlighting, as well as stains, bent corners, or any other major defect, but the text is not obscured in any way. N° de ref. del artículo 3527346686-7-1
Learn about fundamental and advanced topics in etching with this practical guide
Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching.
The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology.
Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from:
Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Acerca del autor:
Thorsten Lill, PhD, is Vice President of Emerging Etch Technologies and Systems at Lam Research. He received his doctorate in Physics from the Albert Ludwigs University in Freiburg, Germany and researched as a post doc at the Argonne National Laboratory. He has published 88 articles in the field and holds 89 patents.
Título: Atomic Layer Processing: Semiconductor Dry ...
Editorial: Wiley-VCH (edition 1)
Año de publicación: 2021
Encuadernación: Paperback
Condición: Fair
Edición: 1.
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