SILICON SURFACES & FORMATION OF...: Basic Science in the Industrial World - Tapa dura

Hans-Joachim Müssig; Jarek Dabrowsk; JAREK DABROWSKI & HAN JOACHIM MUSSIG

 
9789810232863: SILICON SURFACES & FORMATION OF...: Basic Science in the Industrial World
Tapa dura
ISBN 10: 9810232861 ISBN 13: 9789810232863
Editorial: World Scientific, 2000

Sinopsis

Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references are numerous and organized in tables, allowing a search without the need to browse through the text.

Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.

"Sinopsis" puede pertenecer a otra edición de este libro.

Reseña del editor

Silicon, the basic material for a multibillion-dollar industry, is the most widely researched and applied semiconductor, and its surfaces are the most thoroughly studied of all semiconductor surfaces. Silicon Surfaces and Formation of Interfaces may be used as an introduction to graduate-level physics and chemical physics. Moreover, it gives a specialized and comprehensive description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. This knowledge is presented in a systematic and easy-to-follow way. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. The literature is easily available, and the references are numerous and organized in tables, allowing a search without the need to browse through the text.Though this volume focuses on a scientific understanding of physics on the atomistic and mesoscopic levels, it also highlights existing and potential links between basic research in surface science and applications in the silicon industry. It will be valuable to anyone writing a paper, thesis, or proposal in the field of silicon surfaces.

Reseña del editor

Silicon, the basic material for a multi-billion dollar industry, is the most widely-researched and applied semiconductor. This volume offers a description of the most common faces of silicon crystals as well as their interaction with adsorbates and overlayers. Discussion of each system is preceded by a brief overview which categorizes the features and physical mechanisms before the details are presented. Focusing on a scientific understanding of physics on the atomistic and mesoscopic levels, the text also highlights existing and potential links between basic research in surface science and applications in the silicon industry.

"Sobre este título" puede pertenecer a otra edición de este libro.

Editorial
World Scientific
Año de publicación
2000
Idioma
Inglés
ISBN 10 
9810232861
ISBN 13 
9789810232863
Encuadernación
Tapa dura
Número de páginas
576
Contacto del fabricante
no disponible
Persona responsable
gpsr@libri.de
gpsr@libri.de

Friedensallee 273
Hamburg
22763
Alemania