Language:English.SoftCover.Pub Date:2014-05-01.publisher:Tsinghua University Press.description:Pub Date: 2014-05-01 Language: English Publisher: Tsinghua University Press. for IC resistance capacitance extraction senior field solver technology resistance. capacitance (RC) extraction is an important step in the design nanometer manufacturing
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Librería: liu xing, Nanjing, JS, China
paperback. Condición: New. Pub Date: 2014-05-01 Language: English Publisher: Tsinghua University Press. for IC resistance capacitance extraction senior field solver technology resistance. capacitance (RC) extraction is an important step in the design nanometer manufacturing process of integrated circuits. by It interconnects in integrated circuits or electrical substrate coupling effects were modeled for further circuit performance verification. manufacturing yield analysis provides the basis. RC extraction method for . Nº de ref. del artículo: BY024438
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