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Photoelasticity: Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986 - Tapa blanda

Nisida, Masataka

 
9784431680413: Photoelasticity: Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986
Tapa blanda
ISBN 10: 4431680411 ISBN 13: 9784431680413
Editorial: Springer, 2013

Sinopsis

Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.

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Reseña del editor

Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) · This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo­ elasticity in a broad sense, including, in addition to long estab­ lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre­ hensive collection of photoelastic expertises.

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Editorial
Springer
Año de publicación
2013
Idioma
Inglés
ISBN 10 
4431680411
ISBN 13 
9784431680413
Encuadernación
Tapa blanda
Número de páginas
312
Contacto del fabricante
no disponible
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