Advanced Nano Deposition Methods - Tapa dura

 
9783527340255: Advanced Nano Deposition Methods
Tapa dura
ISBN 10: 3527340254 ISBN 13: 9783527340255
Editorial: Blackwell Verlag GmbH, 2016

Sinopsis

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail.
Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

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Acerca del autor

Yuan Lin obtained her PhD in condensed materials from the University of Science and Technology in Hefei, China, in 1999. She continued as a research associate in the Institute of Physics at the Chinese Academic Science in Bejing, China, followed by the University of Houston and Los Alamos National Laboratory, USA, as well as a senior engineer at Intel Corp., USA.
Currently, she is a Yangtze River Scholar Chair Professor at the University of Electronic Science and Technology in Chengdu, China. She has worked in the field of thin film and nanomaterials for about 20 years. Her area of expertise includes advanced material research using pulsed laser deposition, rf-sputtering and chemical-solution deposition.
Dr. Lin has authored more than 90 scientific publications and 13 patents.

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Editorial
Blackwell Verlag GmbH
Año de publicación
2016
Idioma
Inglés
ISBN 10 
3527340254
ISBN 13 
9783527340255
Encuadernación
Tapa dura
Número de páginas
328
Editor
Lin Yuan
Contacto del fabricante
no disponible
Persona responsable
no disponible