Sinopsis
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
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Reseña del editor
The concept of a 'virtual semiconductor fab' requires a focused effort among engineering, physics, chemistry, materials, mathematical and computational sciences. Although widely used by the semiconductor industry, current technology computer-aided design (TCAD) struggles to keep pace with new generations of IC technology. The semiconductor industry needs improved, predictive physically-based modelling and simulation capabilities to decrease cost, improve efficiency, and provide TCAD tools to process developers before production begins. Without the use of more advanced next generation TCAD models, future IC technology development will slow as a result of expensive, time-consuming experimental validation of processes and device performance. This book brings together researchers from industry, universities and national laboratories to highlight advances in TCAD, and to identify critical areas for future emphasis. Both silicon and compound semiconductor process and device performance modelling are featured. Topics include: bulk process modelling; equipment modelling; topography modelling; and characterization and device modelling.
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Semiconductor Process and Device Performance Modeling (Materials Research Society Symposium Proceedings, Volume 490)
Publicado por
Materials Research Society, 1998
ISBN 10: 1558993959
ISBN 13: 9781558993952
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Librería: Zubal-Books, Since 1961, Cleveland, OH, Estados Unidos de America
Calificación del vendedor: 5 de 5 estrellas
Condición: Good. 273 pp., hardcover, ex library, else text and binding clean and tight. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country. Nº de ref. del artículo: ZB529335
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