Site Characterization and Aggregation of Implanted Atoms in Materials: 47 (NATO Science Series B:) - Tapa blanda

 
9781468410174: Site Characterization and Aggregation of Implanted Atoms in Materials: 47 (NATO Science Series B:)
Tapa blanda
ISBN 10: 1468410172 ISBN 13: 9781468410174
Editorial: Springer, 2012

Sinopsis

Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro­ posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under­ standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.

"Sinopsis" puede pertenecer a otra edición de este libro.

Reseña del editor

Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro­ posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under­ standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.

"Sobre este título" puede pertenecer a otra edición de este libro.

Editorial
Springer
Año de publicación
2012
Idioma
Inglés
ISBN 10 
1468410172
ISBN 13 
9781468410174
Encuadernación
Tapa blanda
Número de páginas
536
Editor
Perez A., Coussement R.
Contacto del fabricante
no disponible
Persona responsable
CMN Printpool Inh. Mathis Neumann
https://www.also.com/ec/cms5/en_6000/6000/index.jsp

Friedrich-Karl-Str. 9
Hamburg
Alemania

Otras ediciones populares con el mismo título

9780306402999: Site Characterization and Aggregation of Implanted Atoms in Materials: 47 (NATO Science Series B:)

Edición Destacada

ISBN 10:  0306402998 ISBN 13:  9780306402999
Editorial: Kluwer Academic / Plenum Publishers, 1980
Tapa dura