MOS Interface Physics, Process and Characterization - Tapa dura

Wang, Shengkai; Wang, Xiaolei

 
9781032106274: MOS Interface Physics, Process and Characterization
Tapa dura
ISBN 10: 1032106271 ISBN 13: 9781032106274
Editorial: CRC Press, 2021

Sinopsis

The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.

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Acerca del autor

Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents.

Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.

"Sobre este título" puede pertenecer a otra edición de este libro.

Editorial
CRC Press
Año de publicación
2021
Idioma
Inglés
ISBN 10 
1032106271
ISBN 13 
9781032106274
Encuadernación
Tapa dura
Número de edición
1
Número de páginas
174
Contacto del fabricante
no disponible
Persona responsable
no disponible

Otras ediciones populares con el mismo título

9781032106281: MOS Interface Physics, Process and Characterization

Edición Destacada

ISBN 10:  103210628X ISBN 13:  9781032106281
Editorial: CRC Press, 2021
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