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Micro- And Nanopatterning Polymers: No. 706 (ACS Symposium S.) - Tapa dura

Ito, Hiroshi; Reichmanis, Elsa; Nalamasu, Omkaram; Ueno, Takumi

 
9780841235816: Micro- And Nanopatterning Polymers: No. 706 (ACS Symposium S.)
Tapa dura
ISBN 10: 0841235813 ISBN 13: 9780841235816
Editorial: American Chemical Society, 1998

Sinopsis

Use of polymers is widespread in the electronics industry, both in manufacturing integrated circuits and as components in the completed devices. In addition to providing an update in conventional microlithography technology, this book describes new patterning techniques involving block copolymers, direct deposition of metal oxides and other materials, and image-wise chemical deposition. It illustrates the challenges and opportunities in designing ArF excimer laser resists in the next generation of lithographic technology. Also included are discussions of material design alternatives, acid generator chemistries, and acid diffusion mechanisms in chemically amplified resists, which have now replaced novolac/diazoquinone resists in device manufacturing. Providing insights into breakthroughs in nano-technology, this book is designed to be an important step in the development of integrated circuits. This book is intended for graduate level polymer scientists in the microelectronics industry.

"Sinopsis" puede pertenecer a otra edición de este libro.

Críticas

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Reseña del editor

Use of polymers is widespread in the electronics industry, both in manufacturing integrated circuits and as components in the completed devices. In addition to providing an update in conventional microlithography technology, this book describes new patterning techniques involving block copolymers, direct deposition of metal oxides and other materials, and image-wise chemical deposition. It illustrates the challenges and opportunities in designing ArF excimer laser resists in the next generation of lithographic technology. Also included are discussions of material design alternatives, acid generator chemistries, and acid diffusion mechanisms in chemically amplified resists, which have now replaced novolac/diazoquinone resists in device manufacturing. Providing insights into breakthroughs in nano-technology, this book is designed to be an important step in the development of integrated circuits. This book is intended for graduate level polymer scientists in the microelectronics industry.

"Sobre este título" puede pertenecer a otra edición de este libro.

Editorial
American Chemical Society
Año de publicación
1998
Idioma
Inglés
ISBN 10 
0841235813
ISBN 13 
9780841235816
Encuadernación
Tapa dura
Número de páginas
400
Contacto del fabricante
no disponible
Persona responsable
Messaggerie Libri
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