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Sinopsis
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
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Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
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Optical Imaging in Projection Microlithography
Librería: Rarewaves.com UK, London, Reino Unido
Calificación del vendedor: 5 de 5 estrellas
Paperback. Condición: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Nº de ref. del artículo: LU-9780819458292
Cantidad disponible: 2 disponibles
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Librería: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Irlanda
Calificación del vendedor: 5 de 5 estrellas
Condición: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Nº de ref. del artículo: V9780819458292
Cantidad disponible: 1 disponibles
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Optical Imaging in Projection Microlithography
Librería: Rarewaves.com USA, London, LONDO, Reino Unido
Calificación del vendedor: 5 de 5 estrellas
Paperback. Condición: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Nº de ref. del artículo: LU-9780819458292
Cantidad disponible: 2 disponibles
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Librería: Kennys Bookstore, Olney, MD, Estados Unidos de America
Calificación del vendedor: 5 de 5 estrellas
Condición: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Books ship from the US and Ireland. Nº de ref. del artículo: V9780819458292
Cantidad disponible: 1 disponibles
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Publicado por
Society of Photo Optical, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Librería: Revaluation Books, Exeter, Reino Unido
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Paperback. Condición: Brand New. illustrated edition. 276 pages. 9.75x6.75x0.50 inches. In Stock. Nº de ref. del artículo: __0819458295
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Optical Imaging in Projection Microlithography
Librería: PBShop.store UK, Fairford, GLOS, Reino Unido
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PAP. Condición: New. New Book. Shipped from UK. Established seller since 2000. Nº de ref. del artículo: FW-9780819458292
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Optical Imaging in Projection Microlithography
Publicado por
SPIE - International Society for Optical Engineering, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Librería: Majestic Books, Hounslow, Reino Unido
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Condición: New. pp. xix + 254 Illus. Nº de ref. del artículo: 6352633
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Optical Imaging In Projection Microlithography
Librería: GreatBookPricesUK, Woodford Green, Reino Unido
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Condición: New. Nº de ref. del artículo: 3440771-n
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Optical Imaging In Projection Microlithography
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Optical Imaging In Projection Microlithography
Publicado por
SPIE Publications, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Librería: GreatBookPrices, Columbia, MD, Estados Unidos de America
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Condición: As New. Unread book in perfect condition. Nº de ref. del artículo: 3440771
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