Atomic Layer Deposition of Nanostructured Materials

0 valoración promedio
( 0 valoraciones por Goodreads )
 
9783527327973: Atomic Layer Deposition of Nanostructured Materials

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).

This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

"Sinopsis" puede pertenecer a otra edición de este libro.

About the Author:

Nicola Pinna studied physical chemistry at the Universit� Pierre et Marie Curie (Paris). He received his PhD in 2001, and in 2002, he moved to the Fritz Haber Institute of the Max Planck Society (Berlin). In 2003, he joined the Max Planck Institute of Colloids and Interfaces (Potsdam). In 2005, he moved to the Martin Luther University, Halle-Wittenberg, as an Assistant Professor of Inorganic Chemistry. Since 2006 he is researcher at the Department of Chemistry and CICECO of the University
of Aveiro and since 2009 he is also Assistant Professor at the School of Chemical and Biological Engineering of the Seoul National University. In 2011 he was ranked among the top 100 materials scientists of the past decade by impact. His research activity is focused on the development of novel routes to nanostructured materials, their characterization, and the study of their physical properties.

Mato Knez studied chemistry at the University of Ulm in Germany. He did his dissertation at the Max Planck Institute of solid state research in Stuttgart from 2000-2003. In 2003 he joined the Max Planck Institute for Microstructure Physics in Halle as a Postdoc where he established the ALD-based research direction. Since 2006 he is leading a research group funded by the German Ministry of Education and Research (BMBF). In January 2012 he will join CIC nanoGUNE in San Sebastian (Spain) as an Ikerbasque Research Professor. His research activities are mainly focused on various aspects of the application of ALD, including the synthesis of optical nanolaminates, infi ltration mechanisms when ALD is applied to soft materials, and ALD-assisted nanofabrication of photonic and plasmonic structures. Aside from ALD he has strong research activites in biotemplated inorganic nanostructures for applications in nanotechnology and medicine.

"Sobre este título" puede pertenecer a otra edición de este libro.

Comprar nuevo Ver libro

Gastos de envío: EUR 3,28
De Reino Unido a Estados Unidos de America

Destinos, gastos y plazos de envío

Añadir al carrito

Los mejores resultados en AbeBooks

1.

Nicola Pinna (editor), Mato Knez (editor)
Editorial: Wiley-VCH 2011-11-23, Weinheim :|Chichester (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Tapa dura Cantidad: 5
Librería
Blackwell's
(Oxford, OX, Reino Unido)
Valoración
[?]

Descripción Wiley-VCH 2011-11-23, Weinheim :|Chichester, 2011. hardback. Estado de conservación: New. Nº de ref. de la librería 9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 117,70
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 3,28
De Reino Unido a Estados Unidos de America
Destinos, gastos y plazos de envío

2.

Nicola Pinna
Editorial: Wiley VCH (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Cantidad: > 20
Librería
Books2Anywhere
(Fairford, GLOS, Reino Unido)
Valoración
[?]

Descripción Wiley VCH, 2011. HRD. Estado de conservación: New. New Book. Shipped from UK in 4 to 14 days. Established seller since 2000. Nº de ref. de la librería FW-9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 122,11
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 9,83
De Reino Unido a Estados Unidos de America
Destinos, gastos y plazos de envío

3.

Editor: Nicola Pinna (University of Aveiro, Portugal); Editor: Mato Knez (Max-Planck-Institut, Halle, Germany)
Editorial: John Wiley and Sons
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Cantidad: > 20
Librería
INDOO
(Avenel, NJ, Estados Unidos de America)
Valoración
[?]

Descripción John Wiley and Sons. Estado de conservación: New. Brand New. Nº de ref. de la librería 3527327975

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 135,00
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 2,96
A Estados Unidos de America
Destinos, gastos y plazos de envío

4.

Editorial: Wiley VCH
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Tapa dura Cantidad: > 20
Librería
THE SAINT BOOKSTORE
(Southport, Reino Unido)
Valoración
[?]

Descripción Wiley VCH. Hardcover. Estado de conservación: New. New copy - Usually dispatched within 2 working days. Nº de ref. de la librería B9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 137,65
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 7,58
De Reino Unido a Estados Unidos de America
Destinos, gastos y plazos de envío

5.

Nicola Pinna (Editor), Mato Knez (Editor)
Editorial: Wiley-VCH (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Tapa dura Cantidad: 1
Librería
Ergodebooks
(RICHMOND, TX, Estados Unidos de America)
Valoración
[?]

Descripción Wiley-VCH, 2011. Hardcover. Estado de conservación: New. 1. Nº de ref. de la librería DADAX3527327975

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 155,37
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 3,38
A Estados Unidos de America
Destinos, gastos y plazos de envío

6.

Pinna, Nicola / Knez, Mato
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Cantidad: 1
Librería
Valoración
[?]

Descripción Estado de conservación: New. Publisher/Verlag: Wiley-VCH | Clearly structured, the introductory part of this first book on ALD provides a great insight into all aspects of the technique and processes, while the second part focuses on various aspects of nanomaterials and fields of application. | Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique).This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry. | PART I: Introduction to ALDTHEORETICAL MODELING OF ALD PROCESSESIntroductionOverview of Atomistic SimulationsCalculation of Properties Using Quantum SimulationsPrediction of ALD Chemical MechanismsExample of a Calculated ALD Mechanism: ALD of Al2O3 Using TMA and WaterSTEP COVERAGE IN ALDIntroductionGrowth TechniquesStep Coverage Models in ALDExperimental Verifications of Step Coverage ModelsSummaryPRECURSORS FOR ALD PROCESSESIntroductionGeneral Requirements for ALD PrecursorsMetallic Precursors for ALDNonmetal Precursors for ALDConclusionsSOL-GEL CHEMSTRY AND ATOMIC LAYER DEPOSITIONAqueous and Nonaqueous Sol-Gel in SolutionSol-Gel and ALD: An OverviewMechanistic and In Situ StudiesMOLECULAR LAYER DEPOSITION OF HYBRID ORGANIC-INORGANIC FILMSIntroductionGeneral Issues for MLD of Hybrid Organic-Inorganic FilmsMLD Using Trimethylaluminum and Ethylene Glycol in an AB ProcessExpansion to an ABC Process Using Heterobifunctional and Ring-Opening PrecursorsUse of a Homotrifunctional Precursor to Promote Cross-Linking in an AB ProcessMLD of Hybrid Alumina-Siloxane Films Using an ABCD ProcessFuture Prospects for MLD of Hybrid Organic-Inorganic FilmsLOW-TEMPERATURE ATOMIC LAYER DEPOSITIONIntroductionChallenges of LT-ALDMaterials and ProcessesToward Novel LT-ALD ProcessesThin Film Gas Diffusion BarriersEncapsulation of Organic ElectronicsConclusionsPLASMA ATOMIC LAYER DEPOSITIONIntroductionPlasma BasicsPlasma ALD ConfigurationsMerits of Plasma ALDChallenges for Plasma ALDConcluding Remarks and OutlookPART II: Nanostructures by ALDATOMIC LAYER DEPOSITION FOR MICROELECTRONIC APPLICATIONSIntroductionALD Layers for Memory DevicesALD for Logic DevicesConcluding RemarksNANOPATTERNING BY AREA-SELECTIVE ATOMIC LAYER DEPOSITIONConcept of Area-Selective Atomic Layer DepositionChange of Surface PropertiesPatterningApplications of AS-ALDCurrent ChallengesCOATINGS ON HIGH ASPECT RATIO STRUCTURESIntroductionModels and AnalysisCharacterization Methods for ALD Coatings in High Aspect Ratio StructuresExamples of ALD in High Aspect Ratio StructuresNonideal Behavior during ALD in High Aspect RatiosConclusions and Future OutlookCOATINGS OF NANOPARTICLES AND NANOWIRESALD on NanoparticlesVapor-Liquid-Solid Growth of Nanowires by ALDAtomic Layer Epitaxy on NanowiresALD on Semiconductor NWs for Surface PassivationALD-Assisted Formation of NanopeapodsPhotocorrosion of Semiconductor Nanowires Capped by ALD ShellInterface Reaction of Nanowires with ALD ShellALD ZnO on NWs/Tubes as Seed Layer for Growth of HyperbranchConclusionsATOMIC LAYER DEPOSITION ON SOFT MATERIALSIntroductionALD on Polymers for Passivation, Encapsulation, and Surface ModificationALD for Bulk Modification of Natural and Synthetic Polymers and MoleculesALD for Polymer Sacrificial Templating: Nº de ref. de la librería K9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 163,74
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 2,99
De Alemania a Estados Unidos de America
Destinos, gastos y plazos de envío

7.

Nicola Pinna
Editorial: Wiley VCH Verlag Gmbh Nov 2011 (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Cantidad: 1
Librería
Valoración
[?]

Descripción Wiley VCH Verlag Gmbh Nov 2011, 2011. Buch. Estado de conservación: Neu. Neuware - Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). 435 pp. Englisch. Nº de ref. de la librería 9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 155,00
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 12,00
De Alemania a Estados Unidos de America
Destinos, gastos y plazos de envío

8.

Editorial: Wiley-VCH (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Tapa dura Cantidad: 2
Librería
Murray Media
(North Miami Beach, FL, Estados Unidos de America)
Valoración
[?]

Descripción Wiley-VCH, 2011. Hardcover. Estado de conservación: New. Nº de ref. de la librería P113527327975

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 168,07
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 1,68
A Estados Unidos de America
Destinos, gastos y plazos de envío

9.

Editorial: Wiley-VCH (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Tapa dura Primera edición Cantidad: 1
Librería
Irish Booksellers
(Rumford, ME, Estados Unidos de America)
Valoración
[?]

Descripción Wiley-VCH, 2011. Hardcover. Estado de conservación: New. book. Nº de ref. de la librería M3527327975

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 171,21
Convertir moneda

Añadir al carrito

Gastos de envío: GRATIS
A Estados Unidos de America
Destinos, gastos y plazos de envío

10.

Nicola Pinna
Editorial: Wiley VCH Verlag Gmbh Nov 2011 (2011)
ISBN 10: 3527327975 ISBN 13: 9783527327973
Nuevos Cantidad: 1
Librería
Agrios-Buch
(Bergisch Gladbach, Alemania)
Valoración
[?]

Descripción Wiley VCH Verlag Gmbh Nov 2011, 2011. Buch. Estado de conservación: Neu. Neuware - Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). 435 pp. Englisch. Nº de ref. de la librería 9783527327973

Más información sobre esta librería | Hacer una pregunta a la librería

Comprar nuevo
EUR 155,00
Convertir moneda

Añadir al carrito

Gastos de envío: EUR 17,13
De Alemania a Estados Unidos de America
Destinos, gastos y plazos de envío

Existen otras copia(s) de este libro

Ver todos los resultados de su búsqueda