Oxford Handbook of Nanoscience and Technology: Volume 3: Applications (Oxford Handbooks) - Tapa dura

This is an agenda-setting and high-profile book that presents an authoritative and cutting-edge analysis of nanoscience and technology. The Oxford Handbook of Nanoscience and Technology provides a comprehensive and accessible overview of the major achievements in different aspects of this field. The Handbook comprises 3 volumes, structured thematically, with 25 chapters each. Volume I presents fundamental issues of basic physics, chemistry, biochemistry, tribology etc. of nanomaterials. Volume II focuses on the progress made with host of nanomaterials including DNA and protein based nanostructures. Volume III highlights engineering and related developments, with a focus on frontal application areas. All chapters are written by noted international experts in the field. The book should be useful for final year undergraduates specializing in the field. It should prove indispensable to graduate students, and serious researchers from academic and industrial sectors working in the field of Nanoscience and Technology from different disciplines including Physics, Chemistry, Biochemistry, Biotechnology, Medicine, Materials Science, Metallurgy, Ceramics, Information Technology as well as Electrical, Electronic and Computational Engineering.

Dr A.V. Narlikar took his Ph.D. in superconductivity at Cambridge University. He has worked in the field of superconductivity and nanostructures for more than 45 years. He is a Fellow of the Indian Academy of Sciences, National Academy of Sciences (India) and Indian National Science Academy. He has held many visiting appointments at various international universities and previously for many years he served as the Director Grade Scientist at the National Physical Laboratory, New Delhi, India. ience ersity. He received his Ph.D. in Materials Science and Engineering from Shanghai Jiao Tong University (SJTU) in 1998, and then worked as a postdoctoral research fellow at University of Science and Technology Beijing, and Peking University. He has been JSPS Research Fellow at Tohoku University in Japan and a visiting scholar at the Hong Kong University of Science & Technology.