Organometallic Vapor-Phase Epitaxy: Theory and Practice - Tapa dura

Organometallic Vapor-Phase Epitaxy describes the operation of a particular technique for the production of compound semiconductor materials. It describes how the technique works, how it can be used for the growth of particular materials and structures, and the application of these materials for specific devices. It contains not only a fundamental description of the operation of the technique but also contains lists of data useful for the everyday operation of OMVPE reactors. It also offers specific recipes that can be used to produce a wide range of specific materials, structures, and devices.

• Updated with new emphasis on the semiconducting nitride materials―GaN and its alloys with In and Al
• Emphasizes the newly understood aspects of surface processes
• Contains a new chapter, as well as several new sections in chapters on thermodynamics and kinetics

Organometallic vapor phase epitaxy is the major technique used for the commercial production of compound semiconductor materials for devices such as light emitting diodes, laser diodes, solar cells, photo cathodes, and many others. The use of this technique has been expanding rapidly during the last decade and has only recently reached a state of maturity. This is the only single-author book treating the entire scope of OMVPE from the fundamental aspects of the technique to applications for individual, specific materials, structures and devices. Thus, this book will be useful as a teaching tool for people unfamiliar with the field. It will be widely used as a text for advanced level epitaxial growth courses. It will also be useful for the practicing engineer using OMVPE—giving not only a description of the fundaments of OMVPE, but also lists of the characteristics of the technique, the properties of commonly used precursors, etc., as well as descriptions of specific recipes for the production of specific materials.