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Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials) - Tapa dura
Sinopsis
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of semiconductor nanostructures reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
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Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing
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Elsevier Science Aug 2015, 2015
ISBN 10: 0081002505
ISBN 13: 9780081002506
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Librería: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Alemania
Calificación del vendedor: 5 de 5 estrellas
Buch. Condición: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. 328 pp. Englisch. Nº de ref. del artículo: 9780081002506
Cantidad disponible: 2 disponibles
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DIRECTED SELFASSEMBLY OF BLOCK COPOLYMER
Librería: Speedyhen, London, Reino Unido
Calificación del vendedor: 5 de 5 estrellas
Condición: NEW. Nº de ref. del artículo: NW9780081002506
Cantidad disponible: 1 disponibles
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Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)
Publicado por
Woodhead Publishing Ltd 2015-08-03, 2015
ISBN 10: 0081002505
ISBN 13: 9780081002506
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Librería: Chiron Media, Wallingford, Reino Unido
Calificación del vendedor: 4 de 5 estrellas
Hardcover. Condición: New. Nº de ref. del artículo: 6666-ELS-9780081002506
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing
Impresión bajo demandaLibrería: Brook Bookstore On Demand, Napoli, NA, Italia
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Condición: new. Questo è un articolo print on demand. Nº de ref. del artículo: f0d46fd27067f483e20dc20a39e45a0e
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Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing
Impresión bajo demandaLibrería: AHA-BUCH GmbH, Einbeck, Alemania
Calificación del vendedor: 5 de 5 estrellas
Buch. Condición: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Nº de ref. del artículo: 9780081002506
Cantidad disponible: 2 disponibles
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing
Librería: Revaluation Books, Exeter, Reino Unido
Calificación del vendedor: 5 de 5 estrellas
Hardcover. Condición: Brand New. 1st edition. 328 pages. 9.00x6.25x0.75 inches. In Stock. Nº de ref. del artículo: __0081002505
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)
Librería: Ria Christie Collections, Uxbridge, Reino Unido
Calificación del vendedor: 5 de 5 estrellas
Condición: New. In. Nº de ref. del artículo: ria9780081002506_new
Cantidad disponible: 1 disponibles